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LIU Feng (刘凤), XU Yuping (徐玉平), ZHOU Haishan (周海山), et al.. Exposure of Equal-Channel Angular Extruded Tungsten to Deuterium Plasma[J]. Plasma Science and Technology, 2015, 17(7): 595-600. DOI: 10.1088/1009-0630/16/17/7/12
Citation: LIU Feng (刘凤), XU Yuping (徐玉平), ZHOU Haishan (周海山), et al.. Exposure of Equal-Channel Angular Extruded Tungsten to Deuterium Plasma[J]. Plasma Science and Technology, 2015, 17(7): 595-600. DOI: 10.1088/1009-0630/16/17/7/12

Exposure of Equal-Channel Angular Extruded Tungsten to Deuterium Plasma

  • Surface morphology and deuterium retention in ultrafine-grained tungsten fabricated by equal-channel angular pressing (ECAP) have been examined after exposure to a low energy, high-flux deuterium (D) plasma at fluences of 3×1024 D/m 2 and 1×10 25 D/m 2 in a temperature range of 100 ? C-150 ? C. The methods used were scanning electron microscopy (SEM) and thermal desorption spectroscopy (TDS). Sparse and small blisters (∼0.1 μm) were observed by SEM after D plasma irradiation on every irradiated surface; yet they did not exhibit significant structure or plasma fluence dependence. Larger blisters or protrusions appeared after subsequent TDS heating up to 1000 ? C. The TDS results showed a single D desorption peak at ∼220 ? C for all samples and the D retention increased with increasing numbers of extrusion passes, i.e., the decrease of grain sizes. The increased D retention in this low temperature range should be attributed to the faster diffusion of D along the larger volume fraction of grain boundaries introduced by ECAP.
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