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MAO Yangwu(毛样武), GUO Beibei(郭贝贝), NIE Dunwei(聂敦伟), Domenico MOMBELLO. Tarnish Testing of Copper-Based Alloys Coated with SiO 2 -Like Films by PECVD[J]. Plasma Science and Technology, 2014, 16(5): 486-490. DOI: 10.1088/1009-0630/16/5/08
Citation: MAO Yangwu(毛样武), GUO Beibei(郭贝贝), NIE Dunwei(聂敦伟), Domenico MOMBELLO. Tarnish Testing of Copper-Based Alloys Coated with SiO 2 -Like Films by PECVD[J]. Plasma Science and Technology, 2014, 16(5): 486-490. DOI: 10.1088/1009-0630/16/5/08

Tarnish Testing of Copper-Based Alloys Coated with SiO 2 -Like Films by PECVD

  • The tarnishing test in the presence of hydrogen sulfide (H 2 S) vapors has been used to investigate the tarnish resistance capability of copper-based alloys coated with SiO 2 -like films by means of plasma-enhanced chemical vapor deposition (PECVD) fed with a tetraethoxysi- lane/oxygen mixture. The chemical and morphological properties of the films have been char- acterized by using infrared absorption spectroscopy (IR) and scanning electron microscopy (SEM) with energy disperse spectroscopy (EDS). The corrosion products of the samples after the tarnish- ing test have been identified by X-ray diffraction analysis (XRD). It has been found that SiO 2 -like films formed via PECVD with a high O 2 flow rate could protect copper-based alloys from H 2 S vapor tarnishing. The alloys coated at the O 2 flow rate of 20 sccm remain uncorroded after 54 days of H 2 S vapor tarnish testing. The corrosion products for the alloys deposited at a low O 2 flow rate after 54 days of tarnish testing are mainly composed of brochantite.
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