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Hongyu FAN, Chunjie NIU, Xiaoping LI, Weifeng LIU, Yang ZHANG, Weiyuan NI, Yinghui ZHANG, Lu LIU, Dongping LIU, Günther BENSTETTER, Guangjiu LEI, Jinhai NIU. W fuzz layers: very high resistance to sputtering under fusion-relevant He+ irradiations[J]. Plasma Science and Technology, 2022, 24(1): 015601. DOI: 10.1088/2058-6272/ac35a2
Citation: Hongyu FAN, Chunjie NIU, Xiaoping LI, Weifeng LIU, Yang ZHANG, Weiyuan NI, Yinghui ZHANG, Lu LIU, Dongping LIU, Günther BENSTETTER, Guangjiu LEI, Jinhai NIU. W fuzz layers: very high resistance to sputtering under fusion-relevant He+ irradiations[J]. Plasma Science and Technology, 2022, 24(1): 015601. DOI: 10.1088/2058-6272/ac35a2

W fuzz layers: very high resistance to sputtering under fusion-relevant He+ irradiations

  • In this study, we have modeled the sputtering process of energetic He+ ions colliding with W nano-fuzz materials, based on the physical processes, such as the collision and diffusion of energetic particles, sputtering and redeposition. Our modeling shows that the fuzzy nanomaterials with a large surface-to-volume ratio exhibit very high resistance to sputtering under fusion-relevant He+ irradiations, and their sputtering yields are mainly determined by the thickness of fuzzy nano-materials, the reflection coefficients and mean free paths of energetic particles, surface sputtering yields of a flat base material, and the geometry of nano-fuzz. Our measurements have confirmed that the surface sputtering yield of a W nano-fuzz layer with the columnar geometry of nano-fuzz in cross-section is about one magnitude of order lower than the one of smooth W substrates. This work provides a complete model for energetic particles colliding with the nano-fuzz layer and clarifies the fundamental sputtering process occurring in the nano-fuzz layer.
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