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Plasma Sci. Technol. ›› 2018, Vol. 20 ›› Issue (10): 105401.doi: 10.1088/2058-6272/aad379

• Low Temperature Plasma • Previous Articles     Next Articles

Ion property and electrical characteristics of 60 MHz very-high-frequency magnetron discharge at low pressure

Amin JIANG (蒋阿敏)1, Chao YE (叶超)1,2, Xiangying WANG (王响英)3, Min ZHU (朱敏)1 and Su ZHANG (张苏) 3   

  

  1. 1 School of Physics Science and Technology, Soochow University, Suzhou 215006, People’s Republic of China
    2 Key Laboratory of Thin Films of Jiangsu Province, Soochow University, Suzhou 215006, People’s Republic of China
    3 Medical College, Soochow University, Suzhou 215123, People’s Republic of China
  • Received:2018-05-12 Published:2018-07-13
  • Supported by:

    The work was supported by National Natural Science Foun- dation of China (Nos. 11675118 and 11275136).

Abstract:

The pre-ionized 60 MHz very-high-frequency (VHF) magnetron discharge at low pressure, assisted by inductively coupled plasma (ICP) discharge, was developed. The measurement of ion flux density and ion energy to the substrate was carried out by a retarding field energy analyzer. The electric characteristics of discharge were also investigated by voltage–current probe technique. It was found that by reducing the discharge pressure of VHF magnetron discharge from 5 to 1 Pa, the ion flux density increased about four times, meanwhile the ion energy also increased doubly. The electric characteristics of discharge also showed that a little improvement of sputtering effectiveness was achieved by reducing discharge pressure. Therefore, the deposition property of VHF (60 MHz) magnetron sputtering can be improved by reducing the discharge pressure using the ICP-assisted pre-ionized discharge.

Key words: VHF magnetron sputtering, low pressure discharge, ion property, electric characteristic