Plasma Sci. Technol.
Citation Search Quick Search
Plasma Sci. Technol.  2018, Vol. 20 Issue (8): 085402     DOI: 10.1088/2058-6272/aabb9f
Low Temperature Plasma Current Issue| Archive| Adv Search |
Bended probe diagnostics of the plasma characteristics within an ECR ion source with a rectangular waveguide
Juan YANG (杨涓), Yuliang FU (付瑜亮), Xianchuang LIU (刘宪闯), Haibo MENG (孟海波) and Yizhou JIN (金逸舟)
School of Astronautic, Northwestern Polytechnical University, Xi’an 710072, People’s Republic of China

Copyright © Plasma Sci. Technol.
Address: Institute of Plasma Physics, Chinese Academy of Sciences, P. O. Box 1126, Hefei 230031, China
Tel: +86-551-65591617  65593176   Fax: +86-551-65591310  E-mail: