Hanghang WANG (王行行), Liyan ZHANG (张丽艳), Wenqi LU (陆文琪), Jun XU (徐军). Continuous compositional spread investigation of SiC-based thin films prepared by MW-ECR plasma enhanced magnetron co-sputteringJ. Plasma Science and Technology, 2020, 22(3): 34010-034010. DOI: 10.1088/2058-6272/ab618a
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Citation:
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Hanghang WANG (王行行), Liyan ZHANG (张丽艳), Wenqi LU (陆文琪), Jun XU (徐军). Continuous compositional spread investigation of SiC-based thin films prepared by MW-ECR plasma enhanced magnetron co-sputteringJ. Plasma Science and Technology, 2020, 22(3): 34010-034010. DOI: 10.1088/2058-6272/ab618a
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Hanghang WANG (王行行), Liyan ZHANG (张丽艳), Wenqi LU (陆文琪), Jun XU (徐军). Continuous compositional spread investigation of SiC-based thin films prepared by MW-ECR plasma enhanced magnetron co-sputteringJ. Plasma Science and Technology, 2020, 22(3): 34010-034010. DOI: 10.1088/2058-6272/ab618a
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Citation:
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Hanghang WANG (王行行), Liyan ZHANG (张丽艳), Wenqi LU (陆文琪), Jun XU (徐军). Continuous compositional spread investigation of SiC-based thin films prepared by MW-ECR plasma enhanced magnetron co-sputteringJ. Plasma Science and Technology, 2020, 22(3): 34010-034010. DOI: 10.1088/2058-6272/ab618a
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