Characterization of W Coating on Cu Substrate Prepared by Double-Glow Discharge

ZHANG Fubin(张福斌); WANG Zhenduo(王正铎); CHEN Qiang (陈强); CAI Huiping(蔡惠平)

doi:10.1088/1009-0630/14/1/15

Plasma Science and Technology > 2012 > 14(1): 71-74. > DOI: 10.1088/1009-0630/14/1/15

ZHANG Fubin(张福斌), WANG Zhenduo(王正铎), CHEN Qiang (陈强), CAI Huiping(蔡惠平). Characterization of W Coating on Cu Substrate Prepared by Double-Glow Discharge[J]. Plasma Science and Technology, 2012, 14(1): 71-74. DOI: 10.1088/1009-0630/14/1/15

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Characterization of W Coating on Cu Substrate Prepared by Double-Glow Discharge

Laboratory of Plasma Physics and Material, Beijing Institute of Graphic Communication, Beijing 102600, China

Funds: supported by NSFC (No. 11175024), Beijing Natural Science Foundation (No.1112012), and 2011BAD24B01, KM 201110015008, KM 201010015005 and PHR20110516.

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Received Date: August 05, 2011

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Abstract

Abstract

In this study, tungsten (W) was coated on a copper (Cu) substrate by using double-glow discharge technology using a pure W panel as the target and argon (Ar) as the discharge and sputtering gas. The crystal structure of the W coating was examined by x-ray diffraction (XRD). Scanning electron microscopy (SEM) was performed with cross-section images to investigate the penetration depth of W into the Cu body. Additionally, the properties of wearability resistance, corrosion resistance and mechanical strength of the W coated Cu matrix were also measured. It is concluded that in double-glow plasma, W coated Cu can be facilely prepared. It is noticed that the treatment temperature heavily dominates the properties of the W-Cu composite
- double-glow discharge,
- W-Cu,
- characterizations

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