Characterization of W Coating on Cu Substrate Prepared by Double-Glow Discharge

In this study, tungsten (W) was coated on a copper (Cu) substrate by using double-glow discharge technology using a pure W panel as the target and argon (Ar) as the discharge and sputtering gas. The crystal structure of the W coating was examined by x-ray diffraction (XRD). Scanning electron microscopy (SEM) was performed with cross-section images to investigate the penetration depth of W into the Cu body. Additionally, the properties of wearability resistance, corrosion resistance and mechanical strength of the W coated Cu matrix were also measured. It is concluded that in double-glow plasma, W coated Cu can be facilely prepared. It is noticed that the treatment temperature heavily dominates the properties of the W-Cu composite