Advanced Search+
S. M. BORGHEI, S. SHAHIDI, M. GHORANNEVISS, Z. ABDOLAHI. Investigations into the Anti-Felting Properties of Sputtered Wool Using Plasma Treatment[J]. Plasma Science and Technology, 2013, 15(1): 37-42. DOI: 10.1088/1009-0630/15/1/07
Citation: S. M. BORGHEI, S. SHAHIDI, M. GHORANNEVISS, Z. ABDOLAHI. Investigations into the Anti-Felting Properties of Sputtered Wool Using Plasma Treatment[J]. Plasma Science and Technology, 2013, 15(1): 37-42. DOI: 10.1088/1009-0630/15/1/07

Investigations into the Anti-Felting Properties of Sputtered Wool Using Plasma Treatment

More Information
  • Received Date: May 31, 2011
  • In this research the e®ects of mordant and plasma sputtering treatments on the crystallinity and morphological properties of wool fabrics were investigated. The felting behavior of the treated samples was also studied. We used madder as a natural dye and copper sulfate as a metal mordant. We also used copper as the electrode material in a DC magnetron plasma sputtering device. The anti-felting properties of the wool samples before and after dying was studied, and it was shown that the shrink resistance and anti-felting behavior of the wool had been significantly improved by the plasma sputtering treatment. In addition, the percentage of crystallinity and the size of the crystals were investigated using an X-ray di®ractometer, and a scanning electron microscope was used for morphological analysis. The amount of copper particles on the surface of the mordanted and sputtered fabrics was studied using the energy dispersive X- ray (EDX) method, and the hydrophobic properties of the samples were examined using the water drop test. The results show that with plasma sputtering treatment, the hydrophobic properties of the surface of wool become super hydrophobic.
  • Related Articles

    [1]Yu CHEN, Jiawei LUO, Wen LEI, Yan SHEN, Shuai CAO. Analysis and prediction of sputtering yield using combined hierarchical clustering analysis and artificial neural network algorithms[J]. Plasma Science and Technology, 2024, 26(11): 115504. DOI: 10.1088/2058-6272/ad709c
    [2]Min ZHU (朱敏), Chao YE (叶超), Xiangying WANG (王响英), Amin JIANG (蒋阿敏), Su ZHANG (张苏). Effect of radio-frequency substrate bias on ion properties and sputtering behavior of 2 MHz magnetron sputtering[J]. Plasma Science and Technology, 2019, 21(1): 15507-015507. DOI: 10.1088/2058-6272/aae7dd
    [3]Yan YUAN (袁燕), Lizhen YANG (杨丽珍), Zhongwei LIU (刘忠伟), Qiang CHEN (陈强). High power impulse magnetron sputtering and its applications[J]. Plasma Science and Technology, 2018, 20(6): 65501-065501. DOI: 10.1088/2058-6272/aa9e48
    [4]Xifeng CAO (曹希峰), Guanrong HANG (杭观荣), Hui LIU (刘辉), Yingchao MENG (孟颖超), Xiaoming LUO (罗晓明), Daren YU (于达仁). Hybrid–PIC simulation of sputtering product distribution in a Hall thruster[J]. Plasma Science and Technology, 2017, 19(10): 105501. DOI: 10.1088/2058-6272/aa7940
    [5]Peifang YANG (杨培芳), Chao YE (叶超), Xiangying WANG (王响英), Jiamin GUO (郭佳敏), Su ZHANG (张苏). Control of growth and structure of Ag films by the driving frequency of magnetron sputtering[J]. Plasma Science and Technology, 2017, 19(8): 85504-085504. DOI: 10.1088/2058-6272/aa6619
    [6]MIAO Chunguang (苗春光), WANG Xiangqin (王相勤). Mass Deposition, Etching and Sputtering Effects of Low-Energy N + Ion Irradiation on Solid Fly Ash[J]. Plasma Science and Technology, 2013, 15(12): 1232-1236. DOI: 10.1088/1009-0630/15/12/13
    [7]Umm-i-KALSOOM, R. AHMAD, Nisar ALI, I. A. KHAN, Sehrish SALEEM, Uzma IKHLAQ, et al. Effect of Power and Nitrogen Content on the Deposition of CrN Films by Using Pulsed DC Magnetron Sputtering Plasma[J]. Plasma Science and Technology, 2013, 15(7): 666-672. DOI: 10.1088/1009-0630/15/7/12
    [8]PANG Jianhua (庞见华), LU Wenqi (陆文琪), XIN Yu (辛煜), WANG Hanghang (王行行), HE Jia (贺佳), XU Jun (徐军). Plasma Diagnosis for Microwave ECR Plasma Enhanced Sputtering Deposition of DLC Films[J]. Plasma Science and Technology, 2012, 14(2): 172-176. DOI: 10.1088/1009-0630/14/2/17
    [9]MU Zongxin, LIU Shengguang, ZANG Hairong, WANG Chun, MU Xiaodong. Discharge Properties of High-Power Pulsed Unbalanced Magnetron Sputtering[J]. Plasma Science and Technology, 2011, 13(6): 667-671.
    [10]MU Zongxin (牟宗信), WANG Chun (王春), MU Xiaodong (牟晓东), JIA Li (贾莉), LIU Shengguang (刘升光), DONG Chuang(董闯). Experimental Study of the Effect of Applied Magnetic Field on Plasma Properties of Unbalanced Magnetron Sputtering[J]. Plasma Science and Technology, 2010, 12(5): 571-576.

Catalog

    Article views (296) PDF downloads (1683) Cited by()

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return