Tuning Effect of N<sub>2</sub> on Atmospheric-Pressure Cold Plasma CVD of TiO<sub>2</sub> Photocatalytic Films

DI Lanbo; LI Xiaosong; ZHAO Tianliang; CHANG Dalei; LIU Qianqian; ZHU Aimin

doi:10.1088/1009-0630/15/1/11

Plasma Science and Technology > 2013 > 15(1): 64-69. > DOI: 10.1088/1009-0630/15/1/11

DI Lanbo, LI Xiaosong, ZHAO Tianliang, CHANG Dalei, LIU Qianqian, ZHU Aimin. Tuning Effect of N₂ on Atmospheric-Pressure Cold Plasma CVD of TiO₂ Photocatalytic Films[J]. Plasma Science and Technology, 2013, 15(1): 64-69. DOI: 10.1088/1009-0630/15/1/11

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Tuning Effect of N₂ on Atmospheric-Pressure Cold Plasma CVD of TiO₂ Photocatalytic Films

Laboratory of Plasma Physical Chemistry, School of Physics and Optoelectronic Engineering, Dalian University of Technology, Dalian 116024, China

Funds: supported by National Natural Science Foundation of China (Nos. 10835004, 51077009), and the Fundamental Research Funds for the Central Universities

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Received Date: December 15, 2011

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Abstract

Abstract

To deposit TiO2 films through plasma CVD, the partial pressure ratio of O₂ to TiCl₄ should be greater than the stoichiometric ratio (pO2=pTiCl₄> 1). However, this may lead to the formation of powder instead of film on the substrate when using volume dielectric barrier discharge (volume-DBD) at atmospheric pressure. In this study, by adding N2 into the working gas Ar, TiO₂ photocatalytic films were successfully fabricated in the presence of excess O₂ (pO₂=pTiCl₄= 2:6) by using a wire-to-plate atmospheric-pressure volume-DBD. The tuning e®ect of N₂ on the deposition of TiO2 film was studied in detail. The results showed that by increasing the N₂ content, the deposition rate and particle size of the TiO₂ film were reduced, and its photocatalytic activity was enhanced. The tuning mechanism of N₂ is further discussed.

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