Effect of Internal Antenna Coil Power on the Plasma Parameters in 13.56 MHz/60 MHz Dual-Frequency Sputtering

HUANG Fupei (黄福培); YANG Chicheng (杨麒正); YE Chao (叶超); GE Shuibing (葛水兵); et al.

doi:10.1088/1009-0630/15/12/07

Plasma Science and Technology > 2013 > 15(12): 1197-1203. > DOI: 10.1088/1009-0630/15/12/07

HUANG Fupei (黄福培), YANG Chicheng (杨麒正), YE Chao (叶超), GE Shuibing (葛水兵), et al.. Effect of Internal Antenna Coil Power on the Plasma Parameters in 13.56 MHz/60 MHz Dual-Frequency Sputtering[J]. Plasma Science and Technology, 2013, 15(12): 1197-1203. DOI: 10.1088/1009-0630/15/12/07

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Effect of Internal Antenna Coil Power on the Plasma Parameters in 13.56 MHz/60 MHz Dual-Frequency Sputtering

1 School of Physics Science and Technology, Jiangsu Key Laboratory of Thin Films, Soochow University, Suzhou 215006, China 2 Department of Physics, National Tsing Hua University, Hsinchu, Taiwan 30013, China

Funds: supported by National Natural Science Foundation of China (Nos.11275136, 10975105, 11075114)

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Received Date: November 06, 2012

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Abstract

Abstract

The plasma property of a hybrid ICP/sputtering discharge driven by 13.56 MHz/60 MHz power sources was investigated by Langmuir probe measurement. For the pure sputtering discharge, the low electron density and ion flux, the rise of floating potential and plasma potential with increasing power, as well as the bi-Maxwellian distribution of electron en- ergy distributions (EEDFs) were obtained. The assistance of ICP discharge led to the effective increases of electron density and ion flux, the suppression of rise of floating potential and plasma potential, as well as the change of EEDFs from bi-Maxwellian distribution into Maxwellian dis- tribution. The increase of electron density and ion flux, and the EEDFs evolution were related to the effective electron heating by the induced electric field.
- hybrid ICP/sputtering discharge,
- plasma property

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