Mass Deposition, Etching and Sputtering Effects of Low-Energy N <sup>+</sup> Ion Irradiation on Solid Fly Ash

MIAO Chunguang (苗春光); WANG Xiangqin (王相勤)

doi:10.1088/1009-0630/15/12/13

Plasma Science and Technology > 2013 > 15(12): 1232-1236. > DOI: 10.1088/1009-0630/15/12/13

MIAO Chunguang (苗春光), WANG Xiangqin (王相勤). Mass Deposition, Etching and Sputtering Effects of Low-Energy N ⁺ Ion Irradiation on Solid Fly Ash[J]. Plasma Science and Technology, 2013, 15(12): 1232-1236. DOI: 10.1088/1009-0630/15/12/13

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Mass Deposition, Etching and Sputtering Effects of Low-Energy N ⁺ Ion Irradiation on Solid Fly Ash

Key Laboratory of Ion Beam Bioengineering, Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei 230031, China

Funds: supported by National Natural Science Foundation of China (No.20976183)

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Received Date: November 18, 2012

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Abstract

Abstract

Fly ash is an industrial waste created when coal is burned to generate electrical power. In the present study, we used low-energy nitrogen ion implantation on fly ash to improve its surface properties. Scanning electron microscope (SEM), fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS) and inductively coupled plasma-atomic emission spectroscopy (ICP-AES) were used to study the changes of physical and chemical properties of fly ash after N ⁺ ion implantation, and the mechanism of fly ash modified by ion implantation. In the optimal implantation with energy of 5 keV and dose of 15D ₀, the ion beam could effectively increase the specific surface area (approximately 150% increase) of the fly ash. Lots of scratches were generated in the surface of the fly ash after N ⁺ ion implantation, therefore it is good for enhancing the specific surface area. Experimental results show that the ion implantation could open the chemical bonds of Si-O, Si-Al and Al-O, and deposit nitrogen ions on the surface of fly ash.
- fly ash,
- nitrogen ion,
- deposited,
- etching,
- sputtering

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