The Effect of Plasma Surface Treatment on a Porous Green Ceramic Film with Polymeric Binder Materials

Jeong Woo YUN

doi:10.1088/1009-0630/15/6/07

Plasma Science and Technology > 2013 > 15(6): 521-527. > DOI: 10.1088/1009-0630/15/6/07

Jeong Woo YUN. The Effect of Plasma Surface Treatment on a Porous Green Ceramic Film with Polymeric Binder Materials[J]. Plasma Science and Technology, 2013, 15(6): 521-527. DOI: 10.1088/1009-0630/15/6/07

Citation:

PDF (22261 KB)

The Effect of Plasma Surface Treatment on a Porous Green Ceramic Film with Polymeric Binder Materials

Jeong Woo YUN(Jeong Woo YUN)

School of Applied Chemical Engineering, Chonnam National University, Gwangju 500-757, Republic of Korea

More Information

Received Date: June 23, 2011

Graphical Abstract

Abstract

Abstract

To reduce time and energy during thermal binder removal in the ceramic process, plasma surface treatment was applied before the lamination process. The adhesion strength in the lamination films was enhanced by oxidative plasma treatment of the porous green ceramic film with polymeric binding materials. The oxygen plasma characteristics were investigated through experimental parameters and weight loss analysis. The experimental results revealed the need for parameter analysis, including gas material, process time, flow rate, and discharge power, and supported a mechanism consisting of competing ablation and deposition processes. The weight loss analysis was conducted for cyclic plasma treatment rather than continuous plasma treatment for the purpose of improving the film's permeability by suppressing deposition of the ablated species. The cyclic plasma treatment improved the permeability compared to the continuous plasma treatment.
- plasma surface treatment,
- oxidative plasma,
- green ceramic film,
- ablation,
- deposition

FullText(HTML)

References (0)

[1]	Chi-Shung YIP (叶孜崇), Wei ZHANG (张炜), Guosheng XU (徐国盛), Noah HERSHKOWITZ. Automated electron temperature fitting of Langmuir probe I-V trace in plasmas with multiple Maxwellian EEDFs[J]. Plasma Science and Technology, 2020, 22(8): 85404-085404. DOI: 10.1088/2058-6272/ab7f3d
[2]	G KANG, S AN, K KIM, S HONG. An in situ monitoring method for PECVD process equipment condition[J]. Plasma Science and Technology, 2019, 21(6): 64003-064003. DOI: 10.1088/2058-6272/aafb2b
[3]	Arif ULLAH, Majid KHAN, M KAMRAN, R KHAN, Zhengmao SHENG (盛正卯). Monte-Carlo simulation of a stochastic differential equation[J]. Plasma Science and Technology, 2017, 19(12): 125001. DOI: 10.1088/2058-6272/aa8f3f
[4]	CAO Xiaogang (曹小岗), XIA Yuxi (夏玉玺), CHEN Bingzhou (陈炳周), TIAN Shuping (田树平), WANG Chunling (王春玲), YANG Dangxiao (杨党校), XUE Xiaoyan (薛晓艳), ZHANG Weiwei (张卫卫), WANG Jianqiang (王建强), GOU Fujun (苟富均), ZHU Zichuan (朱自川), OU Wei (欧巍), CHEN Shunli (陈顺礼). Langmuir Probe Measurements of an Expanding Argon Plasma[J]. Plasma Science and Technology, 2015, 17(1): 20-24. DOI: 10.1088/1009-0630/17/1/05
[5]	Hadar MANIS-LEVY, Tsachi LIVNEH, Ido ZUKERMAN, Moshe H. MINTZ, Avi RAVEH. Effect of Radio-Frequency and Low-Frequency Bias Voltage on the Formation of Amorphous Carbon Films Deposited by Plasma Enhanced Chemical Vapor Deposition[J]. Plasma Science and Technology, 2014, 16(10): 954-959. DOI: 10.1088/1009-0630/16/10/09
[6]	MAO Yangwu(毛样武), GUO Beibei(郭贝贝), NIE Dunwei(聂敦伟), Domenico MOMBELLO. Tarnish Testing of Copper-Based Alloys Coated with SiO₂ -Like Films by PECVD[J]. Plasma Science and Technology, 2014, 16(5): 486-490. DOI: 10.1088/1009-0630/16/5/08
[7]	LIU Xuan(刘璇), GE Jie(葛婕), YANG Yi(杨轶), SONG Yixu(宋亦旭), REN Tianling(任天令). Feature Scale Simulation of PECVD of SiO ₂ in SiH ₄ /N₂ O Mixture[J]. Plasma Science and Technology, 2014, 16(4): 385-389. DOI: 10.1088/1009-0630/16/4/15
[8]	QI Lei(齐磊), ZHANG Chunmei(张春梅), CHEN Qiang(陈强). Properties of Plasma Enhanced Chemical Vapor Deposition Barrier Coatings and Encapsulated Polymer Solar Cells[J]. Plasma Science and Technology, 2014, 16(1): 45-49. DOI: 10.1088/1009-0630/16/1/10
[9]	CHEN Lei, MA Mingwang, Li Ming, JIN Dazhi, TAN Xiaohua, DAI Jingyi, YANG Lin, HU Side. Radial and Angular Resolved Langmuir Probe Diagnosis of a Pulsed Vacuum Arc Plasma[J]. Plasma Science and Technology, 2011, 13(6): 689-692.
[10]	WU Jing (吴静), ZHANG Pengyun (张鹏云), SUN Jizhong (孙继忠), YAO Lieming (姚列明), DUAN Xuru(段旭如). Diagnostics of Parameters by Optical Emission Spectroscopy and Langmuir Probe in Mixtures (SiH4/C2H4/Ar) Ratio-Frequency Discharge[J]. Plasma Science and Technology, 2011, 13(5): 561-566.