Influences of Bias Voltage and Target Current on Structure, Microhardness and Friction Coefficient of Multilayered TiAlN/ CrN Coatings Synthesized by Cathodic Arc Plasma Deposition

YIN Mingli (阴明利); TIAN Canxin (田灿鑫); WANG Zesong (王泽松); FU Dejun (付德君)

doi:10.1088/1009-0630/15/6/17

Plasma Science and Technology > 2013 > 15(6): 582-585. > DOI: 10.1088/1009-0630/15/6/17

YIN Mingli (阴明利), TIAN Canxin (田灿鑫), WANG Zesong (王泽松), FU Dejun (付德君). Influences of Bias Voltage and Target Current on Structure, Microhardness and Friction Coefficient of Multilayered TiAlN/ CrN Coatings Synthesized by Cathodic Arc Plasma Deposition[J]. Plasma Science and Technology, 2013, 15(6): 582-585. DOI: 10.1088/1009-0630/15/6/17

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Influences of Bias Voltage and Target Current on Structure, Microhardness and Friction Coefficient of Multilayered TiAlN/ CrN Coatings Synthesized by Cathodic Arc Plasma Deposition

1 College of Science, Xi'an Technological University, Xi'an 710032, China 2 School of Physical Science and Technology and Key Laboratory of Arti¯cial Nano-and Micro-materials of Ministry of Education, Wuhan University, Wuhan 430072, China

Funds: supported by the Ministry of Industry and Information Technology of China (No. 2009ZX04012-32) and the International Cooperation Program of Ministry of Science and Technology of China (No. 2011DFR50580)

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Abstract

Abstract

Multilayered TiAlN/CrN coatings have been synthesized on stainless steel substrates by cathodic arc plasma deposition using TiAl and Cr targets. Influences of the bias voltage, cath- ode current ratio I_TiAl/I_Cr, and deposition pressure on the hardness and friction coe±cient of the coatings were investigated. The measurement revealed existence of two cubic phases, face-center- cubic (Cr, Al)N and (Ti, Al)N, in the coatings deposited under various bias voltages except for the coating deposited at -400 V, which is amorphous. The hardness of the coatings was strongly dependent on the I_TiAl/I_Cr ratio and deposition pressure, and reached a maximum of 33 GPa at an ITiAl/ICr ratio of 1.0 and a pressure of 1.0 Pa. The incorporation of the element chromium can reduce the density of pinholes in the coatings and assist the optimization of deposition conditions for high quality TiAlN/CrN coatings.
- TiAlN/CrN,
- cathodic arc plasma,
- hardness,
- friction coefficient

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