Plasma Density Influence on the Properties of a Plasma Filled Rod Pinch Diode

SUN Jiang (孙江); SUN Jianfeng (孙剑锋); YANG Hailiang (杨海亮); ZHANG Pengfei (张鹏飞); et al.

doi:10.1088/1009-0630/15/9/14

Plasma Science and Technology > 2013 > 15(9): 904-907. > DOI: 10.1088/1009-0630/15/9/14

SUN Jiang (孙江), SUN Jianfeng (孙剑锋), YANG Hailiang (杨海亮), ZHANG Pengfei (张鹏飞), et al.. Plasma Density Influence on the Properties of a Plasma Filled Rod Pinch Diode[J]. Plasma Science and Technology, 2013, 15(9): 904-907. DOI: 10.1088/1009-0630/15/9/14

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Plasma Density Influence on the Properties of a Plasma Filled Rod Pinch Diode

State Key Laboratory of Intense Pulsed Radiation Simulation and Effect, Northwest Institute of Nuclear Technology, Xi’an 710024, China

Funds: supported by National Natural Science Foundation of China (No.11105105)

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Received Date: April 11, 2012

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Abstract

Abstract

The rod pinch diode is perfect as a source of accelerators for flash X-ray radiography by virtue of a small and stable spot. But it is not suitable for intensive current drivers because of high diode impendence of 40∼60 ?. However, by employing pre-filled plasma into diode prior to the driving current, the diode impendence can be effectively reduced. Plasma density plays an important role in this process, especially for sheath formation and space charge current in the diode. Analysis and simulation results show that a proper range of plasma density could be 10 ¹⁵ ∼10 ¹⁶ cm ⁻³ .
- plasma density,
- plasma filled rod pinch diode (PFRPD),
- sheath,
- space charge current

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