Linear Plasma Sources for Large Area Film Deposition: A Brief Review

WEI Yu(魏钰); ZUO Xiao(左潇); CHEN Longwei(陈龙威); MENG Yuedong(孟月东); FANG Shidong(方世东); SHEN Jie(沈洁); SHU Xingsheng(舒兴胜)

doi:10.1088/1009-0630/16/4/10

Plasma Science and Technology > 2014 > 16(4): 356-362. > DOI: 10.1088/1009-0630/16/4/10

WEI Yu(魏钰), ZUO Xiao(左潇), CHEN Longwei(陈龙威), MENG Yuedong(孟月东), FANG Shidong(方世东), SHEN Jie(沈洁), SHU Xingsheng(舒兴胜). Linear Plasma Sources for Large Area Film Deposition: A Brief Review[J]. Plasma Science and Technology, 2014, 16(4): 356-362. DOI: 10.1088/1009-0630/16/4/10

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Linear Plasma Sources for Large Area Film Deposition: A Brief Review

Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China

Funds: supported by National Natural Science Foundation of China (No. 11205201)

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Received Date: July 17, 2012

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Abstract

Abstract

By utilization of different excitation power sources, linear plasma sources can be differentiated into DC, RF, VHF, microwave and dual frequency types. Through installing several linear plasma sources in parallel or adopting the so-called roll-to-roll (air-to-air) process, scale uniform linear plasma sources were realized and successfully applied to the deposition of large area uniform dielectric thin films. Furthermore, the magnetic field system can effectively reduce the recombination losses on the wall of the vacuum chamber and enhance the plasma density. Linear plasma sources with approximately one square meter deposition area with the plasma density of 10 ¹¹ cm⁻³ have been developed, some of which have been used for the deposition of dielectric layers and large area plasma etching.
- linear plasma sources,
- large area,
- uniform,
- high density

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References (72)

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