The Effect of Gas Flow Rate on Radio-Frequency Hollow Cathode Discharge Characteristics

ZHAO Guoming(赵国明); SUN Qian(孙倩); ZHAO Shuxia(赵书霞); GAO Shuxia(高书侠); ZHANG Lianzhu(张连珠)

doi:10.1088/1009-0630/16/7/07

Plasma Science and Technology > 2014 > 16(7): 669-676. > DOI: 10.1088/1009-0630/16/7/07

ZHAO Guoming(赵国明), SUN Qian(孙倩), ZHAO Shuxia(赵书霞), GAO Shuxia(高书侠), ZHANG Lianzhu(张连珠). The Effect of Gas Flow Rate on Radio-Frequency Hollow Cathode Discharge Characteristics[J]. Plasma Science and Technology, 2014, 16(7): 669-676. DOI: 10.1088/1009-0630/16/7/07

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The Effect of Gas Flow Rate on Radio-Frequency Hollow Cathode Discharge Characteristics

College of Physics Science and Information Engineering, Hebei Normal University, Shijiazhuang 050024, China

Funds: supported by the Natural Science Foundation of Hebei Province, China (No. A2012205072)

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Received Date: May 16, 2013

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Abstract

Abstract

It is known that gas flow rate is a key factor in controlling industrial plasma pro- cessing. In this paper, a 2D PIC/MCC model is developed for an rf hollow cathode discharge with an axial nitrogen gas flow. The effects of the gas flow rate on the plasma parameters are calculated and the results show that: with an increasing flow rate, the total ion (N ⁺₂, N ⁺ ) density decreases, the mean sheath thickness becomes wider, the radial electric field in the sheath and the axial electric field show an increase, and the energies of both kinds of nitrogen ions increase; and, as the axial ion current density that is moving toward the ground electrode increases, the ion current density near the ground electrode increases. The simulation results will provide a useful reference for plasma jet technology involving rf hollow cathode discharges in N ₂ .
- gas flow rate,
- rf hollow cathode discharge,
- PIC/MCC simulation,
- N ₂plasma

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References (16)

References

1.Chapman B N, Minkiewicz V J. 1978, J. Vac. Sci. Technol., 15: 329

2.Tsujimoto K, Kumihashi T, Tachi S. 1993, Appl. Phys. Lett., 63: 1915

3.Tanaka S, Kern R S, Davis R F. 1994, Appl. Phys. Lett., 65: 2851

4.Chen W, Lu X, Yang Q, et al. 2006, Thin Solid Films, 515: 1970

5.Chowdhury A, Mukhopadhyay S, Ray S. 2008, Sol. Energy Mater. Sol. Cells., 92: 385

6.Janssen G, van Dijk J, Benoy D, et al. 1999, Plasma Sources Sci. Technol., 8: 1

7.Lee H C, Kim A, Moon S Y, et al. 2011, Phys. Plasmas,18: 023501.

8.Tanaka Y, Sakuta T. 2002, J. Phys. D, 35: 468.

9.Okhrimovskyy A, Bogaerts A, Gijbels.R. 2004,.J.Appl. Phys., 96: 3070.

10.Bogaerts A, Okhrimovskyy A, Baguer N, et al. 2005,Plasma Sources Sci. Technol., 14: 191.

11.Barankova H, Bardos L. 1999, Surf. Coat. Technol.,120-121: 704.

12.Yu W, Zhang L Z, Wang J L, et al. 2001, J. Phys. D.,34: 3349.

13.Matsumoto S, Asakura Y, Hirakuri K. 1997, Appl.Phys. Lett., 71: 2707.

14.Zhang L Z, Meng X L, Zhang Su, et al. 2013, Acta.Phys. Sin., 62: 075201 (in Chinese).

15.Xu J L, Jin S X. 1981, Phys. Plasma. Atomic Energy.Press, p.22 (in Chinese).

16.Bardos L, Barankova H. 2001 Surf. Coat. Technol.,146-147: 463.

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