Advanced Search+
WANG Zhaojun(王兆均), JIANG Song(姜松), LIU Kefu(刘克富). Treatment of Wastewater with High Conductivity by Pulsed Discharge Plasma[J]. Plasma Science and Technology, 2014, 16(7): 688-694. DOI: 10.1088/1009-0630/16/7/10
Citation: WANG Zhaojun(王兆均), JIANG Song(姜松), LIU Kefu(刘克富). Treatment of Wastewater with High Conductivity by Pulsed Discharge Plasma[J]. Plasma Science and Technology, 2014, 16(7): 688-694. DOI: 10.1088/1009-0630/16/7/10

Treatment of Wastewater with High Conductivity by Pulsed Discharge Plasma

Funds: supported by National Natural Science Foundation of China (No. 11075041)
More Information
  • Received Date: April 27, 2013
  • A wastewater treatment system was established by means of pulsed dielectric barrier discharge (DBD). The main advantage of this system is that the wastewater is employed as one of the electrodes for the degradation of rhodamine B, which makes use of the high conductivity and lessenes its negative influence on the discharge process. At the same time, the reactive species like ozone and ultraviolet (UV) light generated by the DBD can be utilized for the treatment of wastewater. The effects of some factors like conductivity, peak pulse voltage, discharge frequency and pH values were investigated. The results show that the combination of these reactive species could enhance the degradation of the dye while the ozone played the most important role in the process. The degradation efficiency was enhanced with the increase of energy supplied. The reduc- tion in the concentration of rhodamine B was much more effective with high solution conductivity; under the highest conductivity condition, the degradation rate could rise to 99%.
  • 1.Glaze W H, Kang J, Chapin D H. 1987, Ozone Sci. Eng., 9: 335
    2.Sun B, Sato M, Clements J S. 1999, J. Phys. D: Appl. Phys., 32: 1908
    3.Malik M A, Gha.ar A, Malik S A. 2001, Plasma Sources Sci. Technol., 10: 82
    4.Kim Y K, Kim S A, Lee S B, et al. 2005, Plasma Proc. Polym., 2: 252
    5.Locke B R, Sato M, Sunka P, et al. 2006, Ind. Eng. Chem. Res., 45: 882
    6.Dors M, Mizeraczyk J, Mok Y S. 2006, J. Adv. Oxid. Technol., 9: 139
    7.Mok Y S, Jo J O, Woo C. 2007, J. Adv. Oxid. Technol.,10: 439
    8.Bubnov A G, Burova E Y, Grinevich V I, et al. 2006, Plasma Chem. Plasma Proc., 26: 19
    9.Sahni M, Finney W C, Locke B R. 2005, J. Adv. Oxid. Technol., 8: 105
    10.Wen Y Z, Jiang X Z. 2001, Plasma Chem. Plasma Proc., 21: 345
    11.Li J, Zhou Z, Wang H, et al. 2007, Desalination, 212: 123
    12.Mok Y S, Jo J O. 2007, Korean J. Chem. Eng., 24: 607
    13.Bai C P, Xiong X F, Gong W Q, et al. 2011, Desali- nation, 278: 84.
    14.Tezuka M, Iwasaki M. 2001, Thin Solid Films, 386:204.
    15.Bozic A L, Koprivanac N, Sunka P, et al. 2004, Czech.J. Phys., 54: C958.
    16.Zhang R B, Zhang C, Cheng X X, et al. 2007, J. Hazard. Mater., 142: 105.
    17.Kim Y, Hong S H, Cha M S, et al. 2003, J. Adv. Oxid.Technol., 6: 17.
    18.Zhang R, Wang L, Zhang C, et al. 2006, IEEE Trans.Plasma Sci., 34: 1033.
    19.Eliasson B, Hirth M, Kogelschatz U. 1987, J. Phys. D:Appl. Phys., 20: 1421.
    20.Ternes T A, Stuber J, Herrmann N, et al. 2003, Water.Res., 37: 1976.
    21.Rosenfeldt E J, Linden K G, Canonica S, et al. 2006,Water Res., 40: 3695.
    22.Kurniawan T A, Lo W, Chan G Y S. 2006, Chem. Eng.J., 125: 35.
    23.Mok Y S, Jo J O, Whitehead J C. 2008, J. Chem. Eng.,142: 56.
    24.Liu G X, Lu G X. 2007, Environmental Chemistry, 26:626 (in Chinese).
    25.Muthukumar M, Sargunamani D, Selvakumar N, et al.2004, Dye Pigment, 63: 127.
    26.Hoigne J, Bader H. 1976, Water Res., 10: 376.
    27.Gao J Z, Pu L M, Yang W. 2004, Plasma Proc. Polym.,1: 171.

Catalog

    Article views (224) PDF downloads (1419) Cited by()

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return