Advanced Search+
ZHANG Jiahui (张家辉), LIU Juanjuan (刘娟娟), ZHANG Renxi (张仁熙), HOU Huiqi (侯惠奇), CHEN Shanping (陈善平), ZHANG Yi (张益). Destruction of Gaseous Styrene with a Low-Temperature Plasma Induced by a Tubular Multilayer Dielectric Barrier Discharge[J]. Plasma Science and Technology, 2015, 17(1): 50-55. DOI: 10.1088/1009-0630/17/1/10
Citation: ZHANG Jiahui (张家辉), LIU Juanjuan (刘娟娟), ZHANG Renxi (张仁熙), HOU Huiqi (侯惠奇), CHEN Shanping (陈善平), ZHANG Yi (张益). Destruction of Gaseous Styrene with a Low-Temperature Plasma Induced by a Tubular Multilayer Dielectric Barrier Discharge[J]. Plasma Science and Technology, 2015, 17(1): 50-55. DOI: 10.1088/1009-0630/17/1/10

Destruction of Gaseous Styrene with a Low-Temperature Plasma Induced by a Tubular Multilayer Dielectric Barrier Discharge

Funds: supported by Key Project of Science and Technology Commission of Shanghai Municipality (No. 13231201903) and National Key Technology R&D Program of China (No. 2011BAJ07B04)
More Information
  • Received Date: January 16, 2014
  • The destruction of gaseous styrene was studied using a low-temperature plasma induced by tubular multilayer dielectric barrier discharge (DBD). The results indicate that the applied voltage, gas flow rate, inlet styrene concentration and reactor configuration play impor- tant roles in styrene removal efficiency (η styrene ) and energy yield (EY). Values of η styrene and EY reached 96% and 15567 mg/kWh when the applied voltage, gas flow rate, inlet styrene concentration and layers of quartz tubes were set at 10.8 kV, 5.0 m/s, 229 mg/m3 and 5 layers, respectively. A qualitative analysis of the byproducts and a detailed discussion of the reaction mechanism are also presented. The results could facilitate industrial applications of the new DBD reactor for waste gas treatment.
  • Related Articles

    [1]Min ZHU (朱敏), Chao YE (叶超), Xiangying WANG (王响英), Amin JIANG (蒋阿敏), Su ZHANG (张苏). Effect of radio-frequency substrate bias on ion properties and sputtering behavior of 2 MHz magnetron sputtering[J]. Plasma Science and Technology, 2019, 21(1): 15507-015507. DOI: 10.1088/2058-6272/aae7dd
    [2]Mohamed MOSTAFAOUI, Djilali BENYOUCEF. Electrical model parameters identification of radiofrequency discharge in argon through 1D3V/PIC-MC model[J]. Plasma Science and Technology, 2018, 20(9): 95401-095401. DOI: 10.1088/2058-6272/aac3cf
    [3]Xiang HE (何湘), Chong LIU (刘冲), Yachun ZHANG (张亚春), Jianping CHEN (陈建平), Yudong CHEN (陈玉东), Xiaojun ZENG (曾小军), Bingyan CHEN (陈秉岩), Jiaxin PANG (庞佳鑫), Yibing WANG (王一兵). Diagnostic of capacitively coupled radio frequency plasma from electrical discharge characteristics: comparison with optical emission spectroscopy and fluid model simulation[J]. Plasma Science and Technology, 2018, 20(2): 24005-024005. DOI: 10.1088/2058-6272/aa9a31
    [4]Xifeng CAO (曹希峰), Guanrong HANG (杭观荣), Hui LIU (刘辉), Yingchao MENG (孟颖超), Xiaoming LUO (罗晓明), Daren YU (于达仁). Hybrid–PIC simulation of sputtering product distribution in a Hall thruster[J]. Plasma Science and Technology, 2017, 19(10): 105501. DOI: 10.1088/2058-6272/aa7940
    [5]LU Yijia (路益嘉), JI Linhong (季林红), CHENG Jia (程嘉). Simulation of Dual-Electrode Capacitively Coupled Plasma Discharges[J]. Plasma Science and Technology, 2016, 18(12): 1175-1180. DOI: 10.1088/1009-0630/18/12/06
    [6]HAN Qing (韩卿), WANG Jing (王敬), ZHANG Lianzhu (张连珠). PIC/MCC Simulation of Radio Frequency Hollow Cathode Discharge in Nitrogen[J]. Plasma Science and Technology, 2016, 18(1): 72-78. DOI: 10.1088/1009-0630/18/1/13
    [7]ZHANG Zhihui(张志辉), WU Xuemei(吴雪梅), NING Zhaoyuan(宁兆元). The Effect of Inductively Coupled Discharge on Capacitively Coupled Nitrogen-Hydrogen Plasma[J]. Plasma Science and Technology, 2014, 16(4): 352-355. DOI: 10.1088/1009-0630/16/4/09
    [8]YOU Zuowei(尤左伟), DAI Zhongling(戴忠玲), WANG Younian(王友年). Simulation of Capacitively Coupled Dual-Frequency N 2, O 2, N 2 /O 2 Discharges: Effects of External Parameters on Plasma Characteristics[J]. Plasma Science and Technology, 2014, 16(4): 335-343. DOI: 10.1088/1009-0630/16/4/07
    [9]DAI Zhongling(戴忠玲), YUE Guang(岳光), WANG Younian(王友年). Simulations of Ion Behaviors in a Photoresist Trench During Plasma Etching Driven by a Radio-Frequency Source[J]. Plasma Science and Technology, 2012, 14(3): 240-244. DOI: 10.1088/1009-0630/14/3/10
    [10]WANG Yan(王燕), LIU Xiang-Mei(刘相梅), SONG Yuan-Hong(宋远红), WANG You-Nian(王友年). e-dimensional fluid model of pulse modulated radio-frequency SiH4/N2/O2 discharge[J]. Plasma Science and Technology, 2012, 14(2): 107-110. DOI: 10.1088/1009-0630/14/2/05

Catalog

    Article views (399) PDF downloads (1073) Cited by()

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return