Advanced Search+
LIN Baozhu (林宝珠), WANG Lingling (王玲玲), WAN Qiang (万强), YAN Shaojian (闫少健), WANG Zesong (王泽松), YANG Bing (杨兵), FU Dejun (付德君). Low Friction-Coefficient TiBCN Nanocomposite Coatings Prepared by Cathode Arc Plasma Deposition[J]. Plasma Science and Technology, 2015, 17(3): 221-227. DOI: 10.1088/1009-0630/17/3/09
Citation: LIN Baozhu (林宝珠), WANG Lingling (王玲玲), WAN Qiang (万强), YAN Shaojian (闫少健), WANG Zesong (王泽松), YANG Bing (杨兵), FU Dejun (付德君). Low Friction-Coefficient TiBCN Nanocomposite Coatings Prepared by Cathode Arc Plasma Deposition[J]. Plasma Science and Technology, 2015, 17(3): 221-227. DOI: 10.1088/1009-0630/17/3/09

Low Friction-Coefficient TiBCN Nanocomposite Coatings Prepared by Cathode Arc Plasma Deposition

Funds: supported by National Natural Science Foundation of China (Nos. 11350110206, 11375133) and the Fundamental Research Funds for the Central Universities of China (No. 11275141)
More Information
  • Received Date: March 25, 2014
  • TiBCN nanocomposite coatings were deposited on cemented carbide and Si (100) by a cathode arc plasma system, in which TiB 2 cathodes were used in mixture gases of N 2 and C 2 H 2 . X-ray diffraction shows that TiB 2 and Ti 2 B 5 peaks enhance at low flow rates of C 2 H 2, but they shrink when the flow rate is over 200 sccm. An increase of deposition rate was obtained from different TiBCN thicknesses for the same deposition time measured by scanning electron mi- croscopy. Atomic force microscopy shows that the surface roughnesses are ∼10 nm and ∼20 nm at C 2 H 2 flow rates of 0-100 sccm and of 150-300 sccm, respectively. High resolution transmis- sion electron microscopy and X-ray photoelectron spectroscopy show that the coatings consist of nanocrystal phases Ti 2 B 5, TiB 2 and TiN, and amorphous phase carbon and BN. The average crystal sizes embedded in the amorphous matrices are 200 nm and 10 nm at C 2 H 2 flow rates of 200 sccm and 300 sccm, respectively. In Raman spectra, the D- and G-bands increase with C 2 H 2 flows at low flow rates, but weaken at high flow rates. The microhardness of the coatings decreases from 28.6 GPa to 20 GPa as the C 2 H 2 increases from 0 sccm to 300 sccm, and the ball-on-disk measurement shows a dramatic decrease of the friction coefficient from 0.84 to 0.13. The reason for the reduced hardness and friction coefficient with the change of C 2 H 2 flow rates is discussed.
  • Related Articles

    [1]Bin TIAN, Mario MERINO, Jie WAN, Yuan HU, Yong CAO. Investigation of radial heat conduction with 1D self-consistent model in helicon plasmas[J]. Plasma Science and Technology, 2023, 25(1): 015401. DOI: 10.1088/2058-6272/ac8399
    [2]Andrey SHASHKOV, Mikhail TYUSHEV, Alexander LOVTSOV, Dmitry TOMILIN, Dmitrii KRAVCHENKO. Machine learning-based method to adjust electron anomalous conductivity profile to experimentally measured operating parameters of Hall thruster[J]. Plasma Science and Technology, 2022, 24(6): 065502. DOI: 10.1088/2058-6272/ac59e1
    [3]Wei YANG, Fei GAO, Younian WANG. Conductivity effects during the transition from collisionless to collisional regimes in cylindrical inductively coupled plasmas[J]. Plasma Science and Technology, 2022, 24(5): 055401. DOI: 10.1088/2058-6272/ac56ce
    [4]Jin LIU, Xinbo ZHU, Xueli HU, Xin TU. Plasma-assisted ammonia synthesis in a packed-bed dielectric barrier discharge reactor: roles of dielectric constant and thermal conductivity of packing materials[J]. Plasma Science and Technology, 2022, 24(2): 025503. DOI: 10.1088/2058-6272/ac39fb
    [5]Sh RAHMATALLAHPUR, A ROSTAMI, S KHORRAM. Two-dimensional analysis of a negative differential conductance gate transistor as a THz emitter[J]. Plasma Science and Technology, 2017, 19(4): 45001-045001. DOI: 10.1088/2058-6272/aa4ee2
    [6]A F POPOVICH, V G RALCHENKO, V K BALLA, A K MALLIK, A A KHOMICH, A P BOLSHAKOV, D N SOVYK, E E ASHKINAZI, V Yu YUROV. Growth of 4″ diameter polycrystalline diamond wafers with high thermal conductivity by 915 MHz microwave plasma chemical vapor deposition[J]. Plasma Science and Technology, 2017, 19(3): 35503-035503. DOI: 10.1088/2058-6272/19/3/035503
    [7]Pascal ANDRE, William BUSSIERE, Alain COULBOIS, Jean-Louis GELET, David ROCHETTE. Modelling of Electrical Conductivity of a Silver Plasma at Low Temperature[J]. Plasma Science and Technology, 2016, 18(8): 812-820. DOI: 10.1088/1009-0630/18/8/04
    [8]WANG Zhaojun(王兆均), JIANG Song(姜松), LIU Kefu(刘克富). Treatment of Wastewater with High Conductivity by Pulsed Discharge Plasma[J]. Plasma Science and Technology, 2014, 16(7): 688-694. DOI: 10.1088/1009-0630/16/7/10
    [9]Zakir HUSSAIN, LIU Chan (刘婵), ZHANG Nianmei (张年梅), NI Mingjiu (倪明玖). Instability in Three-Dimensional Magnetohydrodynamic Flows of an Electrically Conducting Fluid[J]. Plasma Science and Technology, 2013, 15(12): 1263-1270. DOI: 10.1088/1009-0630/15/12/19
    [10]WANG Xiaoping (王小平), ZHANG Xingwang (张兴旺), LEI Lecheng (雷乐成). High Conductivity Water Treatment Using Water Surface Discharge with Nonmetallic Electrodes[J]. Plasma Science and Technology, 2013, 15(6): 528-534. DOI: 10.1088/1009-0630/15/6/08

Catalog

    Article views (405) PDF downloads (1309) Cited by()

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return