Effects of Tailed Pulse-Bias on Ion Energy Distributions and Charging Effects on Insulating Substrates

A hybrid sheath model, including a fluid model and a Monte Carlo (MC) method, is proposed to study ion energy distributions (IEDs) driven by a radiofrequency (RF) with a tailed pulse-bias on an insulating substrate, where a charging effect is obviously caused by the ions accumulated. This surface charging effect will significantly affect the IEDs on the insulating substrate. In this paper, a voltage compensation method is employed to eliminate the charging effect by making the pulse-bias waveform have a certain gradient. Furthermore, we investigate the IEDs under the condition of different pulse-bias duty ratios, waveforms, amplitudes, and cycle proportions. It is found that the parameters of the pulsed source can effectively modulate the IEDs on the insulating substrate and the charging effect, and more desired IEDs are obtained by using the voltage compensation method with modulations of pulse parameters.