Parametric Study on Arc Behavior of Magnetically Diffused Arc

CHEN Tang (陈瑭); LI Hui (李辉); BAI Bing (白冰); LIAO Mengran (廖梦然); XIA Weidong (夏维东)

doi:10.1088/1009-0630/18/1/02

Plasma Science and Technology > 2016 > 18(1): 6-11. > DOI: 10.1088/1009-0630/18/1/02

CHEN Tang (陈瑭), LI Hui (李辉), BAI Bing (白冰), LIAO Mengran (廖梦然), XIA Weidong (夏维东). Parametric Study on Arc Behavior of Magnetically Diffused Arc[J]. Plasma Science and Technology, 2016, 18(1): 6-11. DOI: 10.1088/1009-0630/18/1/02

Citation:

PDF (372 KB)

Parametric Study on Arc Behavior of Magnetically Diffused Arc

1Department of Thermal Science and Energy Engineering, University of Science and Technology of China, Hefei 230027, China 2Full Dimension Power Tech. Co., Ltd, Beijing 100085, China

Funds: supported by National Natural Science Foundation of China (Nos. 11475174, 11035005 and 50876101)

More Information

Received Date: July 02, 2015

Graphical Abstract

Abstract

Abstract

A model coupling the plasma with a cathode body is applied in the simulation of the diffuse state of a magnetically rotating arc. Four parametric studies are performed: on the external axial magnetic field (AMF), on the cathode shape, on the total current and on the inlet gas velocity. The numerical results show that: the cathode attachment focuses in the center of the cathode tip with zero AMF and gradually shifts off the axis with the increase of AMF; a larger cathode conical angle corresponds to a cathode arc attachment farther away off axis; the maximum values of plasma temperature increase with the total current; the plasma column in front of the cathode tip expands more severely in the axial direction, with a higher inlet speed; the cathode arc attachment shrinks towards the tip as the inlet speed increases. The various results are supposed to be explained by the joint e?ect of coupled cathode surface heating and plasma rotating flow.
- arc modeling,
- cathode arc attachment,
- plasma configuration

FullText(HTML)

References (1)

References

1 Baeva M, Kozakov R, Gorchakov S, et al. 2012, Plasma Sources Sci. Technol., 21: 055027 2 Chen D M and Pfender E. 1981, IEEE Trans. Plasma Sci., 9: 265 3 Hsu K C and Pfender E. 1983, Journal of Applied Physics, 54: 4359 4 Gleizes A, Gonzalez J J and Freton P. 2005, Journal of Physics D: Applied Physics, 38: R153 5 Benilov M S and Cunha M D. 2002, Journal of Physics D: Applied Physics, 35: 1736 6 Heberlein J. 2002, Pure and Applied Chemistry, 74: 327 7 Fauchais P. 2004, Journal of Physics D: Applied Physics, 37: R86 8 Xia W D, Li L C, Zhao Y H, et al. 2006, Applied Physics Letters, 88: 211501 9 Li L C. 2008, Experimental observation and numerical analysis of D. C. arc plasmas dispersed by magnetism [Ph.D]. Univesity of Science and Technology of China, Hefei 10 Baeva M and Uhrlandt D. 2011, Plasma Sources Sci. Technol., 20: 035008 11 Bai B, Zha J, Zhang X N, et al. 2012, Plasma Sci.Technol., 14: 118 12 Li L C and Xia W D. 2008, Japanese Journal of Applied Physics, 47: 273 13 Westhoff R and Szekely J. 1991, Journal of Applied Physics, 70: 3455 14 Bauchire J M, Gonzalez J J and Gleizes A. 1997, Plasma Chemistry and Plasma Processing, 17: 409 15 Bianchini R C, Favalli R C, Pimenta M M, et al. 2000, Journal of Physics D: Applied Physics, 33: 134 16 Park J M, Kim K S, Hwang T H, et al. 2004, IEEE Trans. Plasma Sci., 32: 479 17 Cram L E. 1983, Journal of Physics D: Applied Physics, 16: 1643 18 Lowke J J, Kovitya P and Schmidt H P. 1992, Journal of Physics D: Applied Physics, 25: 1600 19 Lowke J J, Morrow R and Haidar J. 1997, Journal of Physics D: Applied Physics, 30: 2033 20 Sansonnens L, Haidar J and Lowke J J. 2000, Journal of Physics D: Applied Physics, 33: 148 21 Zhu P Y, Lowke J J, Morrow R, et al. 1995, Journal of Physics D: Applied Physics, 28: 1369 22 Chen T, Zhang X N, Bai B, et al. 2015, Plasma Chemistry and Plasma Processing, 35: 61 23 Pfender E. 1980, Pure and Applied Chemistry, 52: 1773 24 Yakhot V and Orszag S A. 1986, Physical Review Letters, 57: 1722 25 Yakhot V, Orszag S A, Thangam S, et al. 1992, Physics of Fluids A: Fluid Dynamics, 4: 1510 26 Benilov M S. 1995, Journal of Physics D: Applied Physics, 28: 286 27 Botticher R and Botticher W. 2000, Journal of Physics D: Applied Physics, 33: 367 28 Morrow R and Lowke J J. 1993, Journal of Physics D: Applied Physics, 26: 634 29 Bini R, Monno M and Boulos M I. 2006, Journal of Physics D: Applied Physics, 39: 3253 30 Wang H X and Chen X. 2005, Plasma Sci. Technol.,7: 3051 31 Li L C and Xia W D. 2008, Chinese Physics B, 17: 649

Cited By