Water Content Effect on Oxides Yield in Gas and Liquid Phase Using DBD Arrays in Mist Spray

CHEN Bingyan (陈秉岩); ZHU Changping (朱昌平); FEI Juntao (费峻涛); HE Xiang (何湘); YIN Cheng (殷澄); WANG Yuan (王媛); JIANG Yongfeng (蒋永锋); CHEN Longwei (陈龙威); GAO Yuan (高远); HAN Qingbang (韩庆邦)

doi:10.1088/1009-0630/18/1/08

Plasma Science and Technology > 2016 > 18(1): 41-50. > DOI: 10.1088/1009-0630/18/1/08

CHEN Bingyan (陈秉岩), ZHU Changping (朱昌平), FEI Juntao (费峻涛), HE Xiang (何湘), YIN Cheng (殷澄), WANG Yuan (王媛), JIANG Yongfeng (蒋永锋), CHEN Longwei (陈龙威), GAO Yuan (高远), HAN Qingbang (韩庆邦). Water Content Effect on Oxides Yield in Gas and Liquid Phase Using DBD Arrays in Mist Spray[J]. Plasma Science and Technology, 2016, 18(1): 41-50. DOI: 10.1088/1009-0630/18/1/08

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Water Content Effect on Oxides Yield in Gas and Liquid Phase Using DBD Arrays in Mist Spray

1Department of Mathematics and Physics, Hohai University, Changzhou 213022, China 2Jiangsu Province Key Laboratory of Environmental Engineering, Nanjing 210036, China 3Hohai University Nantong Institute of Marine and Offshore Engineering, Nantong 226300, China 4College of Energy and Electrical Engineering, Hohai University, Nanjing 210098, China 5College of Internet of Things, Hohai University, Changzhou 213022, China 6College of Mechanical and Electrical Engineering, Hohai University, Changzhou 213022, China 7Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China

Funds: supported by National Natural Science Foundation of China (Nos. 11274092, 51107033, 11404092, 11274091), the Nantong Science and Technology Project, China (No. BK2014024), the Open Project of Jiangsu Province Key Laboratory of Environmental Engineering, China (No. KF2014001), and the Fundamental Research Funds for the Central Universities, China (No. 2014B11414)

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Received Date: August 23, 2015

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Abstract

Abstract

Electric discharge in and in contact with water can accompany ultraviolet (UV) radiation and electron impact, which can generate a large number of active species such as hydroxyl radicals (OH), oxygen radical (O), ozone (O₃) and hydrogen peroxide (H₂O₂). In this paper, a non-thermal plasma processing system was established by means of dielectric barrier discharge (DBD) arrays in water mist spray. The relationship between droplet size and water content was examined, and the effects of the concentrations of oxides in both treated water and gas were investigated under different water content and discharge time. The relative intensity of UV spectra from DBD in water mist was a function of water content. The concentrations of both O₃ and nitrogen dioxide (NO₂) in DBD room decreased with increasing water content. Moreover, the concentrations of H₂O₂,O₃and nitrogen oxides (NO_x) in treated water decreased with increasing water content, and all the ones enhanced after discharge. The experimental results were further analyzed by chemical reaction equations and commented by physical principles as much as possible. At last, the water containing phenol was tested in this system for the concentration from 100 mg/L to 9.8 mg/L in a period of 35 min.
- dielectric barrier discharge (DBD),
- water mist spray,
- water content,
- hydrogen peroxide,
- ozone,
- nitrogen oxides

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References

1 Chen Qiang, Li Junshuai and Li Yongfeng. 2015, J.Phys. D: Appl. Phys., 48: 424005 2 Kong M G, Liu D. 2014, High Voltage Engineering,40: 2956 (in Chinese) 3 Samukawa S, Hori M, Rauf S, et al. 2014, J. Phys. D:Appl. Phys., 45: 253001 4 Bruggeman Peter, Leys Christophe. 2009, J. Phys. D:Appl. Phys., 42: 053001 5 Lu XinPei, Yan Ping, Ren Chunsheng, et al. 2011, Sci.Sin.: Phys. Mech. Astron., 41: 801 (in Chinese) 6 Jimoh O. Tijani, Ojo O. Fatoba, et al. 2014, Water Air Soil Pollut., 225: 2102 7 Mart′ ?nková L, Uhn′ aková B, P′ atek M, et al. 2009, Environ. Int., 35: 162 8 Pˇ acurariua C, Mihoc G, Popa A, et al. 2013, Chem.Eng. J., 222: 218 9 Han Y X, Boateng A A, Qi P X, et al. 2013, J. Environ.Manage., 118: 196 10 Jiang N, Lu N, Shang K F, et al. 2013, J. Hazard.Mater., 262: 387 11 Chen B Y, Zhu C P, Chen L W, et al. 2014, Plasma Sci. Technol., 16: 1126 12 Wang X X. 2009, High Voltage Engineering, 35: 1 (in Chinese) 13 Shao T, Zhang C, Yu Y, et al. 2012, Vacuum, 86: 876 14 Park C W, Byeon J H, Yoon K Y, et al. 2011, Sep. Purif. Technol., 77: 87 15 Yang Xianli, Bai Mindong, Han Fen, et al. 2009, Water Environ. Res., 81: 450 16 Lin Qifu, Ni Guohua, Jiang Yiman, et al. 2014, Plasma Sci. Technol., 16: 1036 17 Wang Xiaoping, Li Zhongjian, Zhang Xingwang, et al. 2014, Plasma Sci. Technol., 16: 479 18 Azooz A A and Waysi S I. 2014, Plasma Sci. Technol.,16: 211 19 Yu Jianyang, Liu Huaping, Xu Dimeng, et al. 2014,Plasma Sci. Technol., 16: 197 20 Lu Na, Feng Yingchun, Li Jie, et al. 2015, IEEE Trans. Plasma Sci., 43: 580 21 Wandell R J, Locke B R. 2014, IEEE Trans. Plasma Sci., 42: 2634 22 Kim K S, Gam S G, Mok Y S. 2015, Chem. Eng. J.,271: 31 23 Jiang Song, Wen Yiyong, Liu Kefu. 2014, Plasma Sci. Technol., 16: 59 24 Bourdelle Franck, Truche Laurent, Pignatelli Isabella, et al. 2014, Chem. Geol., 381: 194 25 Ma Yajuan, Liu Bing, Zhang Yuhua, et al. 2015, Int. J. Hydrogen Energ., 40: 9147 26 Zhao Zhengfeng, Wang Yingzi, Xu Jing, et al. 2015,Appl. Surf. Sci., 351: 416 27 Santangelo P E. 2010, Exp. Therm. Fluid Sci., 34:1353 28 Wiksten R, Assad M E H. 2007, Int. J. Refrig., 30:1207 29 Zhou C H, Cheng S B, Sun J L, et al. 2009, J. Phys.Chem. A, 113: 4923 30 Charles de Izarra. 2000, J. Phys. D: Appl. Phys., 33:1697 31 Yang Q S, Jiang Z L, Peng Z M, et al. 2011, Acta Phys. Sin., 60: 053302 (in Chinese) 32 Dong Lifang, Zhao Longhu, Wang Yongjie, et al. 2014, Specrtosc. Spect. Anal., 34: 308 33 Cybulski H, Bielski A, Ciury? lo R, et al. 2013, J. Quant. Spectrosc. Ra., 120: 90 34 Vyrodov A O, Heinze J, and Meier U E. 1995, J. Quant. Spectrosc. Ra., 53: 227 35 Knutsen K, Dyer M J, and Richard A. 1996, J. Chem. Phys., 104: 5798 36 Li X Y, Lin Z X, Liu Y Y, et al. 2004, Acta Optical Sin., 24: 1051 37 Chen L W, Yu W, Xiao Z, et al. 2012, Thin Solid Films, 521: 226 38 Wang Ruixue, Zhang Cheng, Shen Yuan, et al. 2015,J. Appl. Phys., 118: 123303 39 Kogelschatz U. 2003, Plasma Chem. Plasma Process.,23: 1 40 Abdelaziz A A, Seto T, Abdel S M, et al. 2015, J.Phys. D: Appl. Phys., 48: 195201 41 Abdelaziz A A, Seto T, Abdel S M, et al. 2013, J.Hazard. Mater., 246-247: 26 42 Andreas S, James Y J, Steven E B, et al, 1998, IEEE Trans. Plasma Sci., 26: 1685 43 Yoon J S, Song M Y, Kwon D C, et al. 2014, Physics Reports, 543: 199 44 Liu K F, Zhao H Y, Qiu J. 2009, High Voltage Engineering, 35: 12 (in Chinese) 45 Penetrante B M, Hsiao M C, Bardsley J N, et al. 1997,Plasma Sources Sci. Technol., 6: 251 46 Shih K Y, Bruce R. 2011, IEEE Trans. Plasma Sci.,39: 883 47 Oba Y, Watanabe N, Kouchi A, et al. 2011, Phys.Chem. Chem. Phys., 13: 15792 48 Leong C H, Ponnivalavan B, Rajnish K, et al. 2013,Energy, 63: 252 49 Tas M A, Hardeveld R, Veldhuizen E M. 1997, Plasma Chem. Plasma Process., 17: 371 50 Bagheri M, Mohseni M. 2014, Chem. Eng. J., 256: 51 51 Casasanta G, Sarra A, Meloni D, et al. 2011, Atmos.Environ., 45: 3937 52 Pfister G, Baumgartner D, Maderbacher R, et al. 2000, Atmos. Environ., 34: 4019

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