Citation: | Gun-Su KIM, Chi-Hyung AHN, Seok-Hyun LEE. The Characteristics of CLHS Driving for High Luminance Efficiency in AC PDP[J]. Plasma Science and Technology, 2016, 18(11): 1116-1122. DOI: 10.1088/1009-0630/18/11/10 |
1 Kim Gun-Su and Lee Seok-Hyun. 2010, IEEE Transactions on Plasma Science, 38: 3136 2 Kim Gun-Su and Lee Seok-Hyun. 2011, IEEE Transactions on Plasma Science, 39: 1470 3 Kim Gun-Su, Lee Boong-Joo, Lee Seok-Hyun. 2012,IEEE Transactions on Electron Devices, 59: 3030 4 Kim Jae Young, Kim Hyun, Tae Heung-Sik, et al.2006, IEEE Transactions on Plasma Science, 34: 2579 5 Kim Tae Jun, Kim Joong Kyun, Whang Ki-Woong.2007, IEEE Transactions on Plasma Science, 35: 1775 6 Jung Hae-Yoon, Kim Tae-Jun, Whang Ki-Woong.2010, IEEE Transactions on Plasma Science, 38: 937 7 Choi Kyung Cheol, Jang Cheol, Yun Jin Bhum. 2008,IEEE Transactions on Electron Device, 55: 1338 8 Tae Heung-Sik, Seo Hyun Ju, Jeong Dong-Cheol, et al.2005, IEEE Transactions on Plasma Science, 33: 931 9 Cho Byung-Gwo, Kim Bo-Sung, Tae Heung-Sik,et al. 2005, A New Driving Waveform for ImprovingLuminous E±ciency in AC PDP with Large Sustain Gap under High Xe content. The 36th Society for Information Display Technical Digests Boston, the United State 10 Cho Byung-Gwo, Tae Heung-Sik, Ito Kazuhiro, et al.2006, IEEE Transactions on Plasma Science, 34: 390 11 Kim J H, Jeon M J, Hur G H, et al. 2010, Displays,31: 67 12 Akiyama Toshiyuki, Yamada Takashi, Noguchi Yasuyuki, et al. 2008, Journal of the SID, 16: 835
|
[1] | Rongxiao ZHAI (翟戎骁), Tao HUANG (黄涛), Peitian CONG (丛培天), Weixi LUO (罗维熙), Zhiguo WANG (王志国), Tianyang ZHANG (张天洋), Jiahui YIN (尹佳辉). Comparative study on breakdown characteristics of trigger gap and overvoltage gap in a gas pressurized closing switch[J]. Plasma Science and Technology, 2019, 21(1): 15505-015505. DOI: 10.1088/2058-6272/aae432 |
[2] | Shuqun WU (吴淑群), Fei WU (武菲), Xueyuan LIU (刘雪原), Wen CHEN (陈文), Chang LIU (刘畅), Chaohai ZHANG (张潮海). Investigation on the characteristics of an atmospheric-pressure microplasma plume confined inside a long capillary tube[J]. Plasma Science and Technology, 2018, 20(10): 105402. DOI: 10.1088/2058-6272/aad082 |
[3] | Siyin ZHOU (周思引), Xueke CHE (车学科), Wansheng NIE (聂万胜), Di WANG (王迪). Effect of actuating voltage and discharge gap on plasma assisted detonation initiation process[J]. Plasma Science and Technology, 2018, 20(6): 65507-065507. DOI: 10.1088/2058-6272/aaac77 |
[4] | Yaqi YANG (杨亚奇), Weiguo LI (李卫国), Yu XIA (夏喻), Chuangye YUAN (袁创业). Characteristics of long-gap AC streamer discharges under low pressure conditions[J]. Plasma Science and Technology, 2017, 19(10): 105401. DOI: 10.1088/2058-6272/aa79fe |
[5] | ZHANG Kaiming (张开明), SUN Dongsheng (孙东升). The Photonic Band Gaps in the Two-Dimensional Plasma Photonic Crystals with Rhombus Lattice[J]. Plasma Science and Technology, 2016, 18(6): 583-589. DOI: 10.1088/1009-0630/18/6/01 |
[6] | CHEN She (陈赦), ZENG Rong (曾嵘), ZHUANG Chijie (庄池杰), ZHOU Xuan (周旋), DING Yujian (丁玉剑). Experimental Study on Branch and Diffuse Type of Streamers in Leader Restrike of Long Air Gap Discharge[J]. Plasma Science and Technology, 2016, 18(3): 305-310. DOI: 10.1088/1009-0630/18/3/15 |
[7] | CHI Yangyang(匙阳阳), ZHANG Yuantao(张远涛). Theoretical Study on the Characteristics of Atmospheric Radio Frequency Discharges by Altering Electrode Gap[J]. Plasma Science and Technology, 2014, 16(6): 582-587. DOI: 10.1088/1009-0630/16/6/08 |
[8] | LIU Jinbo(刘金波), LU Ronghua(陆荣华), GUO Li(郭丽), JIN Yuqi(金玉奇), GUO Jingwei(郭敬为). Long Lifetime Ultracold Plasma Produced by a Nanosecond Laser in a Supersonic Nitric Oxide Molecular Beam Environment[J]. Plasma Science and Technology, 2014, 16(4): 305-310. DOI: 10.1088/1009-0630/16/4/01 |
[9] | LIU Qifa (刘启发), DING Guifu (丁桂甫), YAN Qun (严群), LIU Chang (刘畅), WANG Yan (王艳). Discharge Simulation and Fabrication Process of an Aluminum Electrode and an Alumina Layer in AC-PDP[J]. Plasma Science and Technology, 2013, 15(4): 368-375. DOI: 10.1088/1009-0630/15/4/11 |
[10] | LIU Wenzheng (刘文正), ZHANG Dejin (张德金), KONG Fei (孔飞). The Impact of Electrode Configuration on Characteristics of Vacuum Discharge Plasma[J]. Plasma Science and Technology, 2012, 14(2): 122-128. DOI: 10.1088/1009-0630/14/2/08 |