1 Massines F, Gherardi N, Naud’e N, et al. 2009, Eur.Phys. J. Appl. Phys., 47: 22805 2 Brandenburg R, Maiorov V A, Golubovskii Yu B, et al.2005, J. Phys. D: Appl. Phys., 38: 2187 3 Wang Y H, Shi H, Sun J Z, et al. 2009, Phys. Plasmas,16: 063507 4 Shi J J, Liu D W, and Kong M G. 2007, IEEE Trans.Plasma Sci., 35: 137 5 Golubovskii Yu B, Maiorov V A, Behnke J, et al. 2003,J. Phys. D: Appl. Phys., 36: 39 6 Shao T, Yu Y, Zhang C, et al. 2010, Electr. Insul., 17:1830 7 Xiong Q, Lu X P, Ostrikov K, et al. 2010, Phys. Plasmas, 17: 043506 8 Walsh J L, Shi J J and Kong M G. 2006, Appl. Phys.Lett., 88: 171501 9 Lu X P and Laroussia M. 2006, J. Phys. D: Appl.Phys., 39: 1127 10 Pai D, Lacoste D, Laux C. 2010, J. Appl. Phys., 107:093303 11 Pai D, Stancu G, Lacoste D, et al. 2009, Plasma Sources Sci. Technol., 18: 045030 12 Yang D Z, Yang Y, Li S Z, et al. 2012, Plasma Sources Sci. Technol., 21: 035004 13 Yang D Z, Wang W C, Li S Z, et al. 2010, J. Phys. D:Appl. Phys., 43: 455202 14 Yang Y, Wang W C, Yang D Z, et al. 2012, J. Electrostics, 70: 356 15 Liu Z J, Wang W C, Zhang S, et al. 2012, Eur. Phys.J. D, 66: 319 16 Nudnova M M and Starikovskii A Y. 2008, IEEE Trans. Plasma Sci., 36: 896 17 Wang Y H and Wang D Z. 2006, Acta Physica Sinica, 55: 5923 18 Radu I, Bartnikas R and Wertheimer M R. 2003, J.Phys. D: Appl. Phys., 36: 1284 19 Kulikovsky A A. 1998, Phys. Rev. E, 57: 7066 20 Morrow R. 1985, Phys. Rev. A, 32: 1799 21 Potamianou S, Spyrou N and Loiseau J F. 2002, J.Phys. D: Appl. Phys., 35: 1373 22 Sang C F, Sun J Z, Ren C S, et al. 2009, J. Appl.Phys., 105: 043305 23 Li X W. 2013, J. Phys.: Conf. Ser., 418: 012012 24 Lama W L and Gallo C F. 1974, J. Appl. Phys., 45:103 25 Stewart R A and Lieberman M A. 1991, J. Appl. Phys.,70: 3481 26 Mankowski J, Dickens J, Kristiansen M. 1998, IEEE Trans. Plasma Sci., 26: 874 27 Shao T, Sun G S, Yan P, et al. 2006, High Power Laser and Particle Beams, 18: 1031 28 Tao F B, Zhang Q G, Wei X, et al. 2011, IEEE Trans.Plasma Sci., 39: 2252
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