Control of growth and structure of Ag films by the driving frequency of magnetron sputtering

Peifang YANG (杨培芳); Chao YE (叶超); Xiangying WANG (王响英); Jiamin GUO (郭佳敏); Su ZHANG (张苏)

doi:10.1088/2058-6272/aa6619

Plasma Science and Technology > 2017 > 19(8): 85504-085504. > DOI: 10.1088/2058-6272/aa6619

Peifang YANG (杨培芳), Chao YE (叶超), Xiangying WANG (王响英), Jiamin GUO (郭佳敏), Su ZHANG (张苏). Control of growth and structure of Ag films by the driving frequency of magnetron sputtering[J]. Plasma Science and Technology, 2017, 19(8): 85504-085504. DOI: 10.1088/2058-6272/aa6619

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Control of growth and structure of Ag films by the driving frequency of magnetron sputtering

1 College of Physics, Optoelectronics and Energy, Soochow University, Suzhou 215006, People’s Republic of China
2 Key Laboratory of Thin Films of Jiangsu Province, Soochow University, Suzhou 215006, People’s Republic of China
3 Medical College, Soochow University, Suzhou 215123, People’s Republic of China

Funds: The work was supported by National Natural Science Foundation of China (Nos. 11675118 and 11275136).

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Abstract

Abstract

The growth and structural properties of Ag films prepared by radio-frequency (2, 13.56 and 27.12 MHz) and very-high-frequency (40.68 and 60 MHz) magnetron sputtering were investigated. Using 2 MHz sputtering, the Ag film has a high deposition rate, a uniform and smooth surface and a good fcc structure. Using 13.56 and 27.12 MHz sputtering, the Ag films still have a high deposition rate and a good fcc structure, but a non-uniform and coarse surface. Using 40.68 MHz sputtering, the Ag film has a moderate deposition rate and a good fcc structure, but a less smooth surface. Using 60 MHz sputtering, the Ag film has a uniform and smooth surface, but a low deposition rate and a poor fcc structure. The growth and structural properties of Ag films are related to the ions’ energy and flux density. Therefore, changing the driving frequency is a good way to control the growth and structure of the Ag films.
- Ag films,
- RF and VHF magnetron sputtering,
- structural property

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