Interactions between multiple filaments and bacterial biofilms on the surface of an apple

He CHENG (程鹤); Maoyuan XU (徐茂源); Shuhui PAN (潘姝慧); Xinpei LU (卢新培); Dawei LIU (刘大伟)

doi:10.1088/2058-6272/aa9d7e

Plasma Science and Technology > 2018 > 20(4): 44006-044006. > DOI: 10.1088/2058-6272/aa9d7e

He CHENG (程鹤), Maoyuan XU (徐茂源), Shuhui PAN (潘姝慧), Xinpei LU (卢新培), Dawei LIU (刘大伟). Interactions between multiple filaments and bacterial biofilms on the surface of an apple[J]. Plasma Science and Technology, 2018, 20(4): 44006-044006. DOI: 10.1088/2058-6272/aa9d7e

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Interactions between multiple filaments and bacterial biofilms on the surface of an apple

1 State Key Lab of Advanced Electromagnetic Engineering and Technology, Huazhong University of Science and Technology, Wuhan 430074, People’s Republic of China 2 IFSA Collaborative Innovation Center, Shanghai Jiao Tong University, Shanghai 200240, People’s Republic of China

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Received Date: October 10, 2017

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Abstract

Abstract

In this paper, the interactions between two dielectric barrier discharge (DBD) filaments and three bacterial biofilms are simulated. The modeling of a DBD streamer is studied by means of 2D finite element calculation. The model is described by the proper governing equations of air DBD at atmospheric pressure and room temperature. The electric field in the computing domain and the self-consistent transportation of reactive species between a cathode and biofilms on the surface of an apple are realized by solving a Poisson equation and continuity equations. The electron temperature is solved by the electron energy conservation equation. The conductivity and permittivity of bacterial biofilms are considered, and the shapes of the bacterial biofilms are irregular in the uncertainty and randomness of colony growth. The distribution of the electrons suggests that two plasma channels divide into three plasma channels when the streamer are 1 mm from the biofilms. The toe-shapes of the biofilms and the simultaneous effect of two streamer heads result in a high electric field around the biofilms, therefore the stronger ionization facilitates the major part of two streamers combined into one streamer and three streamers arise. The distribution of the reactive oxygen species and the reactive nitrogen species captured by time fluences are non-uniform due to the toe-shaped bacterial biofilms. However, the plasma can intrude into the cavities in the adjacent biofilms due to the μm-scale mean free path. The two streamers case has a larger treatment area and realizes the simultaneous treatment of three biofilms compared with one streamer case.
- plasma,
- biofilm,
- filaments

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References (46)

References

[1]	Deng X T, Shi J J and Kong M G 2007 J. Appl. Phys. 101 74701
[2]	Machala Z et al 2013 Plasma Process. Polym. 10 649
[3]	Boxhammer V et al 2012 New J. Phys. 14 113042
[4]	Dong X Y and Yang Y L 2014 A novel method of improving nutritional quality of blueberry during storage period Patent ZL 201410389626.6 (in Chinese)
[5]	Niemira B A and Sites J 2008 J. Food Prot. 71 1357
[6]	Lunov O et al 2016 RSC Adv. 6 25286
[7]	Perni S et al 2008 J. Food Prot. 71 302
[8]	R?d S K et al 2012 Food Microbiol. 30 233
[9]	Norhayati M N et al 2016 Arch. Biochem. Biophys. 605 76
[10]	Motrescu I et al 2015 J. Sci. Arts 3 249
[11]	Walsh J L and Kong M G 2008 Appl. Phys. Lett. 93 111501
[12]	Fridman G et al 2006 Plasma Chem. Plasma Process. 26 425
[13]	Iza F, Walsh J L and Kong M G 2009 IEEE Trans. Plasma Sci. 37 1289
[14]	Little J et al 2012 AIAA J. 50 350
[15]	Babaeva N Y and Kushner M J 2013 J. Phys. Appl. Phys. 46 125201
[16]	Vleugels M et al 2005 IEEE Trans. Plasma Sci. 33 824
[17]	Carmichael I et al 1998 J. Appl. Microbiol. 85 45 s
[18]	Naidis G V 2010 J. Phys. Appl. Phys. 43 402001
[19]	Boeuf J-P, Yang L L and Pitchford L C 2013 J. Phys. Appl. Phys. 46 015201
[20]	Breden D, Miki K and Raja L L 2012 Plasma Sources Sci. Technol. 21 034011
[21]	Liu X Y et al 2014 Plasma Sources Sci. Technol. 23 035007
[22]	Cheng H, Lu X and Liu D 2015 Plasma Process. Polym. 12 1343
[23]	Cheng H et al 2016 High Volt. 1 62
[24]	Park G et al 2008 Plasma Process. Polym. 5 569
[25]	Liu D X et al 2010 Plasma Process. Polym. 7 846
[26]	Liu D X et al 2010 Plasma Sources Sci. Technol. 19 025018
[27]	Shimizu T et al 2012 New J. Phys. 14 103028
[28]	Sakiyama Y et al 2012 J. Phys. Appl. Phys. 45 425201
[29]	Yaron S and R?mling U 2014 Microb. Biotechnol. 7 496
[30]	Walsh J L and Kong M G 2007 Appl. Phys. Lett. 91 1539
[31]	Cheng H et al 2016 Phys. Plasmas 23 3494
[32]	Almatroudi A et al 2015 J. Microbiol. Methods 117 171
[33]	Steinberg D 2016 Isr. J. Chem. 56 273
[34]	O’Donnell L E et al 2017 J. Med. Microbiol. 66 54
[35]	Zhuang W et al 2016 RSC Adv. 6 33695
[36]	Murakami T et al 2013 Plasma Sources Sci. Technol. 22 015003
[37]	Maurício R, Dias C J and Santana F 2006 Environ. Monit. Assess. 119 599
[38]	Markx G H et al 1994 Microbiology 140 585
[39]	Liu X Y, He M B and Liu D W 2015 Phys. Plasmas 22 043513
[40]	Barjasteh A and Eslami E 2016 Phys. Plasmas 23 243301
[41]	Deconinck T and Raja L L 2009 Plasma Process. Polym. 6 335
[42]	?imek M 2014 J. Phys. Appl. Phys. 47 463001
[43]	Raizer Y P 1991 Gas Discharge Physics (Berlin: Springer)
[44]	Hayashi Y et al 2016 Plasma Chem. Plasma Process. 37 125
[45]	Baldacchino G and Katsumura Y 2010 Chemical processes in heavy ion tracks Recent Trends in Radiation Chemistry (Singapore: World Scienti?c) p 231
[46]	Hartmann W et al 2009 IEEE Trans. Dielectr. Electr. Insul. 16 1061

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