Citation: | Yan YUAN (袁燕), Lizhen YANG (杨丽珍), Zhongwei LIU (刘忠伟), Qiang CHEN (陈强). High power impulse magnetron sputtering and its applications[J]. Plasma Science and Technology, 2018, 20(6): 65501-065501. DOI: 10.1088/2058-6272/aa9e48 |
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