High power impulse magnetron sputtering and its applications

Yan YUAN (袁燕); Lizhen YANG (杨丽珍); Zhongwei LIU (刘忠伟); Qiang CHEN (陈强)

doi:10.1088/2058-6272/aa9e48

Plasma Science and Technology > 2018 > 20(6): 65501-065501. > DOI: 10.1088/2058-6272/aa9e48

Yan YUAN (袁燕), Lizhen YANG (杨丽珍), Zhongwei LIU (刘忠伟), Qiang CHEN (陈强). High power impulse magnetron sputtering and its applications[J]. Plasma Science and Technology, 2018, 20(6): 65501-065501. DOI: 10.1088/2058-6272/aa9e48

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High power impulse magnetron sputtering and its applications

Lab of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600, People’s Republic of China

Funds: This project was supported by National Natural Science Foundation of China (Grant Nos. 50875132, 60573172), Beijing Municipal National Science Foundation (Grant Nos. 4162024, KZ201510015014, KZ 04190116009/001, KM201510015009, KM201510015002), and the Collaborative Innovation Center of Green Printing & Publishing Technology (No. 20160113).

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Received Date: June 04, 2017

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Abstract

Abstract

High power impulse magnetron sputtering (HiPIMS) has attracted a great deal of attention because the sputtered material is highly ionized during the coating process, which has been demonstrated to be advantageous for better quality coating. Therefore, the mechanism of the HiPIMS technique has recently been investigated. In this paper, the current knowledge of HiPIMS is described. We focus on the mechanical properties of the deposited thin film in the latest applications, including hard coatings, adhesion enhancement, tribological performance, and corrosion protection layers. A description of the electrical, optical, photocatalytic, and functional coating applications are presented. The prospects for HiPIMS are also discussed in this work.
- HiPIMS,
- basic knowledge,
- applications,
- review

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References (126)

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