Plasma characteristics of direct current enhanced cylindrical inductively coupled plasma source

Yue HUA (滑跃); Jian SONG (宋健); Zeyu HAO (郝泽宇); Chunsheng REN (任春生)

doi:10.1088/2058-6272/aaac79

Plasma Science and Technology > 2018 > 20(6): 65402-065402. > DOI: 10.1088/2058-6272/aaac79

Yue HUA (滑跃), Jian SONG (宋健), Zeyu HAO (郝泽宇), Chunsheng REN (任春生). Plasma characteristics of direct current enhanced cylindrical inductively coupled plasma source[J]. Plasma Science and Technology, 2018, 20(6): 65402-065402. DOI: 10.1088/2058-6272/aaac79

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Plasma characteristics of direct current enhanced cylindrical inductively coupled plasma source

Key Laboratory of Materials Modi?cation by Laser, Ion and Electron Beams, Dalian University of Technology, Ministry of Education, Dalian 116024, People’s Republic of China

Funds: This work is supported by National Natural Science Foundation of China (Grant No. 11475038.)

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Received Date: November 25, 2017

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Abstract

Abstract

Experimental results of a direct current enhanced inductively coupled plasma (DCE-ICP) source which consists of a typical cylindrical ICP source and a plate-to-grid DC electrode are reported. With the use of this new source, the plasma characteristic parameters, namely, electron density, electron temperature and plasma uniformity, are measured by Langmuir floating double probe. It is found that DC discharge enhances the electron density and decreases the electron temperature, dramatically. Moreover, the plasma uniformity is obviously improved with the operation of DC and radio frequency (RF) hybrid discharge. Furthermore, the nonlinear enhancement effect of electron density with DC+RF hybrid discharge is confirmed. The presented observation indicates that the DCE-ICP source provides an effective method to obtain high-density uniform plasma, which is desirable for practical industrial applications.
- cylindrical ICP,
- DC + RF hybrid discharge,
- nonlinear enhancement effect

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References (52)

References

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Plasma characteristics of direct current enhanced cylindrical inductively coupled plasma source