Advanced Search+
Yue HUA (滑跃), Jian SONG (宋健), Zeyu HAO (郝泽宇), Chunsheng REN (任春生). Plasma characteristics of direct current enhanced cylindrical inductively coupled plasma source[J]. Plasma Science and Technology, 2018, 20(6): 65402-065402. DOI: 10.1088/2058-6272/aaac79
Citation: Yue HUA (滑跃), Jian SONG (宋健), Zeyu HAO (郝泽宇), Chunsheng REN (任春生). Plasma characteristics of direct current enhanced cylindrical inductively coupled plasma source[J]. Plasma Science and Technology, 2018, 20(6): 65402-065402. DOI: 10.1088/2058-6272/aaac79

Plasma characteristics of direct current enhanced cylindrical inductively coupled plasma source

Funds: This work is supported by National Natural Science Foundation of China (Grant No. 11475038.)
More Information
  • Received Date: November 25, 2017
  • Experimental results of a direct current enhanced inductively coupled plasma (DCE-ICP) source which consists of a typical cylindrical ICP source and a plate-to-grid DC electrode are reported. With the use of this new source, the plasma characteristic parameters, namely, electron density, electron temperature and plasma uniformity, are measured by Langmuir floating double probe. It is found that DC discharge enhances the electron density and decreases the electron temperature, dramatically. Moreover, the plasma uniformity is obviously improved with the operation of DC and radio frequency (RF) hybrid discharge. Furthermore, the nonlinear enhancement effect of electron density with DC+RF hybrid discharge is confirmed. The presented observation indicates that the DCE-ICP source provides an effective method to obtain high-density uniform plasma, which is desirable for practical industrial applications.
  • [1]
    Hong S P et al 2010 Japan. J. Appl. Phys. 49 080217
    [2]
    Tarey R D et al 2016 Plasma Sources Sci. Technol. 26 015009
    [3]
    Mikami H et al 2005 Japan. J. Appl. Phys. 44 3817
    [4]
    Liu Y X et al 2017 Phys. Plasmas 24 073512
    [5]
    Li L S et al 2008 Chin. Phys. Lett. 25 2144
    [6]
    Leou K C et al 1999 Japan. J. Appl. Phys. 38 4268
    [7]
    Lee H C, Lee M H and Chung C W 2010 Appl. Phys. Lett. 96 071501
    [8]
    Speth E et al 1999 Fusion Eng. Des. 46 383
    [9]
    Charles C, Boswell R W and Takahashi K 2012 Plasma Phys. Control. Fusion 54 124021
    [10]
    Nabhiraj P Y et al 2010 Nucl. Instrum. Methods Phys. Res. A 621 57
    [11]
    Charles C and Boswell R W 2012 Plasma Sources Sci. Technol. 21 022002
    [12]
    Cheng Y et al 2015 Chin. Phys. Lett. 32 058102
    [13]
    Wang Z et al 2015 Plasma Sci. Technol. 17 191
    [14]
    Godyak V A, Piejak R B and Alexandrovich B M 2002 Plasma Sources Sci. Technol. 11 525
    [15]
    Jung S J, Kim K N and Yeom G Y 2006 Thin Solid Films 506?507 460
    [16]
    Mishra A and Yeom G Y 2013 Surf. Coat. Technol. 237 440
    [17]
    Kim K N et al 2006 Appl. Phys. Lett. 89 251501
    [18]
    Kim T H et al 2013 Japan. J. Appl. Phys. 52 05EA02
    [19]
    Mishra A et al 2012 Plasma Sources Sci. Technol. 21 035018
    [20]
    Bang J Y et al 2011 Phys. Plasmas 18 073507
    [21]
    Chen Z P et al 2010 Phys. Plasmas 17 103503
    [22]
    Kim H J et al 2015 J. Appl. Phys. 117 153302
    [23]
    Setsuhara Y, Tsukiyama D and Takenaka K 2008 Surf. Coat. Technol. 202 5238
    [24]
    Lee J, Kim K H and Chung C W 2017 Phys. Plasmas 24 023503
    [25]
    Lee K et al 2008 Plasma Sources Sci. Technol. 17 015014
    [26]
    Liu L et al 2015 J. Appl. Phys. 118 083303
    [27]
    Uhm S et al 2004 Phys. Plasmas 11 4830
    [28]
    Takenaka K et al 2006 Japan. J. Appl. Phys. 45 8046
    [29]
    KimK N, Kim M S and Yeom G Y 2006 Appl. Phys. Lett. 88 161503
    [30]
    You K I, Yoon N S and Hwang S M 1999 Surf. Coat. Technol. 114 60
    [31]
    Li W P et al 2008 J. Appl. Phys. 104 083306
    [32]
    Cunge G et al 2001 J. Appl. Phys. 89 3580
    [33]
    Godyak V A and Piejak R B 1993 Appl. Phys. Lett. 63 3137
    [34]
    Seo S H et al 2000 Phys. Rev. E 62 7155
    [35]
    Lieberman M A and Lichtenberg A J 2004 Principles of Plasma Discharges and Materials Processing 2nd edn (New York: Wiley)
    [36]
    Lee H C and Chung C W 2013 Phys. Plasmas 20 101607
    [37]
    Lee H C and Chung C W 2015 Phys. Plasmas 22 053505
    [38]
    Lee D S, Lee Y K and Chang H Y 2004 Plasma Sources Sci. Technol. 13 701
    [39]
    Godyak V A and Alexandrovich B M 2004 Phys. Plasmas 11 3553
    [40]
    Chen Z P et al 2011 Plasma Sci. Technol. 13 175
    [41]
    Kawamura E et al 2008 Plasma Sources Sci. Technol. 17 045002
    [42]
    Zhou L F et al 2015 Vacuum 119 209
    [43]
    Gherardi N et al 2000 Plasma Sources Sci. Technol. 9 340
    [44]
    Wang M M and Kushner M J 2010 J. Appl. Phys. 107 023308
    [45]
    Wang M M and Kushner M J 2010 J. Appl. Phys. 107 023309
    [46]
    Diomede P et al 2012 J. Phys. D: Appl. Phys. 45 175204
    [47]
    Zhang Q Z, Wang Y N and Bogaerts A 2014 J. Appl. Phys. 115 223302
    [48]
    Yamaguchi T et al 2012 J. Phys. D: Appl. Phys. 45 025203
    [49]
    Kawamura E et al 2007 J. Vac. Sci. Technol. A 25 1456
    [50]
    Kato K et al 2000 Appl. Phys. Lett. 76 547
    [51]
    Phukan A, Mishra M K and Chakraborty M 2007 J. Phys. D: Appl. Phys. 40 3616
    [52]
    LeeH C, Lee M H and ChungC W 2010 Appl. Phys. Lett. 96 041503
  • Related Articles

    [1]Yan WANG (王艳), Zhimin LIU (刘智民), Lizhen LIANG (梁立振), Chundong HU (胡纯栋). Preliminary results of optical emission spectroscopy by line ratio method in the RF negative ion source at ASIPP[J]. Plasma Science and Technology, 2019, 21(4): 45601-045601. DOI: 10.1088/2058-6272/aaf592
    [2]Jun WU (吴军), Jian WU (吴健), M T RIETVELD, I HAGGSTROM, Haisheng ZHAO (赵海生), Tong XU (徐彤), Zhengwen XU (许正文). Systematic variation in observing altitude of enhanced ion line by the pump near fifth gyroharmonic[J]. Plasma Science and Technology, 2018, 20(12): 125301. DOI: 10.1088/2058-6272/aadd44
    [3]Xianhai PANG (庞先海), Ting WANG (王婷), Shixin XIU (修士新), Junfei YANG (杨俊飞), Hao JING (景皓). Investigation of cathode spot characteristics in vacuum under transverse magnetic field (TMF) contacts[J]. Plasma Science and Technology, 2018, 20(8): 85502-085502. DOI: 10.1088/2058-6272/aab782
    [4]Xuebao LI (李学宝), Dayong LI (李大勇), Qian ZHANG (张迁), Yinfei LI (李隐飞), Xiang CUI (崔翔), Tiebing LU (卢铁兵). The detailed characteristics of positive corona current pulses in the line-to-plane electrodes[J]. Plasma Science and Technology, 2018, 20(5): 54014-054014. DOI: 10.1088/2058-6272/aaa66b
    [5]HU Yixiang(呼义翔), ZENG Jiangtao(曾江涛), SUN Fengju(孙凤举), WEI Hao(魏浩), YIN Jiahui(尹佳辉), CONG Peitian(丛培天), QIU Aici(邱爱慈). Modeling Methods for the Main Switch of High Pulsed-Power Facilities Based on Transmission Line Code[J]. Plasma Science and Technology, 2014, 16(9): 873-876. DOI: 10.1088/1009-0630/16/9/12
    [6]WU Hanyu(吴撼宇), ZENG Zhengzhong(曾正中), WANG Liangping(王亮平), GUO Ning(郭宁). Experimental Study of Current Loss of Stainless Steel Magnetically Insulated Transmission Line with Current Density at MA/cm Level[J]. Plasma Science and Technology, 2014, 16(6): 625-628. DOI: 10.1088/1009-0630/16/6/16
    [7]ZHU Liying(朱立颖), WU Jianwen(武建文), JIANG Yuan(蒋原). Motion and Splitting of Vacuum Arc Column in Transverse Magnetic Field Contacts at Intermediate-Frequency[J]. Plasma Science and Technology, 2014, 16(5): 454-459. DOI: 10.1088/1009-0630/16/5/03
    [8]DUAN Ping(段萍), ZHOU Xinwei(周新维), LIU Yuan(刘媛), CAO Anning(曹安宁), QIN Haijuan(覃海娟), CHEN Long(陈龙), YIN Yan(殷燕). Effects of Magnetic Field and Ion Velocity on SPT Plasma Sheath Characteristics[J]. Plasma Science and Technology, 2014, 16(2): 161-167. DOI: 10.1088/1009-0630/16/2/13
    [9]LI Hui (李辉), XIE Mingfeng (谢铭丰). Plasma Parameters of a Gliding Arc Jet at Atmospheric Pressure Obtained by a Line-Ratio Method[J]. Plasma Science and Technology, 2013, 15(8): 776-779. DOI: 10.1088/1009-0630/15/8/11
    [10]GUO Jun(郭俊). The Effects of Relative Drift Velocities Between Proton and He2+ on the Magnetic Spectral Signatures in the Plasma Depletion Layer[J]. Plasma Science and Technology, 2011, 13(5): 557-560.

Catalog

    Article views (199) PDF downloads (560) Cited by()

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return