Spectroscopic diagnosis of plasma in atmospheric pressure negative pulsed gas-liquid discharge with nozzle-cylinder electrode

Ming SUN (孙明); Zhan TAO (陶瞻); Zhipeng ZHU (朱志鹏); Dong WANG (王东); Wenjun PAN (潘文军)

doi:10.1088/2058-6272/aab601

Plasma Science and Technology > 2018 > 20(5): 54005-054005. > DOI: 10.1088/2058-6272/aab601

Ming SUN (孙明), Zhan TAO (陶瞻), Zhipeng ZHU (朱志鹏), Dong WANG (王东), Wenjun PAN (潘文军). Spectroscopic diagnosis of plasma in atmospheric pressure negative pulsed gas-liquid discharge with nozzle-cylinder electrode[J]. Plasma Science and Technology, 2018, 20(5): 54005-054005. DOI: 10.1088/2058-6272/aab601

Citation:

PDF (1531 KB)

Spectroscopic diagnosis of plasma in atmospheric pressure negative pulsed gas-liquid discharge with nozzle-cylinder electrode

1 Institute of Electrostatics, Shanghai Maritime University, Shanghai 201306, People’s Republic of China 2 Department of Electrical Automation, Shanghai Maritime University, Shanghai 201306, People’s Republic of China

Funds: This work is supported by National Natural Science Foundation of China (Grant No. 51207089).

More Information

Received Date: November 07, 2017

Graphical Abstract

Abstract

Abstract

The plasma characteristics of a gas-liquid phase discharge reactor were investigated by optical and electrical methods. The nozzle-cylinder electrode in the discharge reactor was supplied with a negative nanosecond pulsed generator. The optical emission spectrum diagnosis revealed that OH (A²∑⁺→X²Π, 306–309 nm), N₂(C³Π→B³Π_g, 337 nm), O (3p⁵p→3s⁵s⁰, 777.2 nm) and O (3p³p→3s³s⁰, 844.6 nm) were produced in the discharge plasma channels. The electron temperature (T_e) was calculated from the emission relative intensity ratio between the atomic O 777.2 nm and 844.6 nm, and it increased with the applied voltage and the pulsed frequency and fell within the range of 0.5–0.8 eV. The gas temperature (T_g) that was measured by Lifbase was in a range from 400 K to 600 K.
- gas-liquid negative pulsed discharge,
- discharge plasma,
- reactivate species,
- nozzlecylinder electrode, diagnosis

FullText(HTML)

References (31)

References

[1]	Meng X et al 2014 High Voltage Engineering 40 232 (in Chinese)
[2]	Zhu L et al 2013 J. Electrost. 71 728
[3]	Tamagawa M, Ihara S and Komaki K 2012 Nihon Kikai Gakkai Ronbunshu B 78 1043
[4]	Tang Q et al 2009 J. Phys. D: Appl. Phys. 42 095203
[5]	Sun M et al 2016 High Voltage Engineering 42 2487 (in Chinese)
[6]	Wang T et al 2016 Water Res. 89 28
[7]	Shang K et al 2017 Chem. Eng. J. 311 378
[8]	Shang K, Wang H and Li J 2017 Plasma Sci. Technol. 19 064017
[9]	Jiang J P et al 2015 Spectroscopy and Spectral Analysis 35 2680 (in Chinese)
[10]	Chen Q and Ichiki T 2015 Plasma Sources Sci. Technol. 24 025022
[11]	Li X C et al 2017 Spectroscopy and Spectral Analysis 37 1696 (in Chinese)
[12]	Dong L et al 2014 Spectroscopy and Spectral Analysis 34 919 (in Chinese)
[13]	Banno M et al 2015 Japan. J. Appl. Phys. 54 066101
[14]	Sun M, Wang S Q and Zhang Y 2013 High Voltage Engineering 39 2514
[15]	Sun M et al 2015 High Voltage Engineering 41 3499 (in Chinese)
[16]	Joshi A A et al 1995 J. Hazardous Mater. 41 3
[17]	Sun B 1997 J. Electrost. 39 189
[18]	Mok Y S and Ham S W 1998 Chem. Eng. Sci. 53 1667
[19]	Lowke J J and Morrow R 1994 Pure Appl. Chem. 66 1287
[20]	Mukkavilli S et al 1998 IEEE Transaction on Plasma Sci.16 652
[21]	LiaoM R et al 2015 Plasma Sci. Technol. 17 743
[22]	Sarani A, Nikiforov A Y and Leys C 2010 Phys. Plasmas 17 063504
[23]	Griem H 1997 Principles of Plasma Spectroscopy (New York: Cambridge University Press)
[24]	van der Sijde B and van der Mullen J A M 1990 J. Quant. Spectrosc. Radiat. Transfer 44 39
[25]	http:/nist.gov/pml/data/asd.cfm
[26]	Pothiraja R et al 2012 J. Phys. D: Appl. Phys. 45 335202
[27]	Zheng S J et al 2013 Acta Phys. Sin. 62 5
[28]	Jauberteau J et al 1999 J. Phys. D: Appl. Phys. 32 445
[29]	Raizer Y P, Kisin V I and Allen J E 1991 Gas Discharge Physics (Berlin: Springer)
[30]	Herzberg G 1950 Molecular Spectra and Molecular Structure (New York: Van Nostrand Reinhold)
[31]	Goyette A N et al 1996 J. Phys. D: Appl. Phys. 29 1197