Ion property and electrical characteristics of 60 MHz very-high-frequency magnetron discharge at low pressure

Amin JIANG (蒋阿敏); Chao YE (叶超); Xiangying WANG (王响英); Min ZHU (朱敏); Su ZHANG (张苏)

doi:10.1088/2058-6272/aad379

Plasma Science and Technology > 2018 > 20(10): 105401. > DOI: 10.1088/2058-6272/aad379

Amin JIANG (蒋阿敏), Chao YE (叶超), Xiangying WANG (王响英), Min ZHU (朱敏), Su ZHANG (张苏). Ion property and electrical characteristics of 60 MHz very-high-frequency magnetron discharge at low pressure[J]. Plasma Science and Technology, 2018, 20(10): 105401. DOI: 10.1088/2058-6272/aad379

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Ion property and electrical characteristics of 60 MHz very-high-frequency magnetron discharge at low pressure

¹ School of Physics Science and Technology, Soochow University, Suzhou 215006, People’s Republic of China
² Key Laboratory of Thin Films of Jiangsu Province, Soochow University, Suzhou 215006, People’s Republic of China
³ Medical College, Soochow University, Suzhou 215123, People’s Republic of China

Funds: The work was supported by National Natural Science Foun- dation of China (Nos. 11675118 and 11275136).

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Received Date: May 11, 2018

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Abstract

Abstract

The pre-ionized 60 MHz very-high-frequency (VHF) magnetron discharge at low pressure, assisted by inductively coupled plasma (ICP) discharge, was developed. The measurement of ion flux density and ion energy to the substrate was carried out by a retarding field energy analyzer. The electric characteristics of discharge were also investigated by voltage–current probe technique. It was found that by reducing the discharge pressure of VHF magnetron discharge from 5 to 1 Pa, the ion flux density increased about four times, meanwhile the ion energy also increased doubly. The electric characteristics of discharge also showed that a little improvement of sputtering effectiveness was achieved by reducing discharge pressure. Therefore, the deposition property of VHF (60 MHz) magnetron sputtering can be improved by reducing the discharge pressure using the ICP-assisted pre-ionized discharge.
- VHF magnetron sputtering,
- low pressure discharge,
- ion property,
- electric characteristic

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References (34)

References

[1]	Br?auer G et al 2010 Vacuum 84 1354
[2]	Kelly P J and Arnell R D 2000 Vacuum 56 159
[3]	Mu Z X et al 2011 Plasma Sci. Technol. 13 667
[4]	Umm-i-Kalsoom et al 2013 Plasma Sci. Technol. 15 666
[5]	Wang Q et al 2013 Plasma Sci. Technol. 15 807
[6]	Yan R et al 2014 Plasma Sci. Technol. 16 1158
[7]	Stranak V et al 2011 Contrib. Plasma Phys. 51 237
[8]	Stranak V et al 2009 J. Phys. D: Appl. Phys. 42 105204
[9]	Stranak V et al 2012 Appl. Phys. Lett. 100 141604
[10]	Huang F P et al 2014 Plasma Sources Sci. Technol. 23 015003
[11]	Ye C et al 2014 Phys. Plasma 21 043509
[12]	Liu Y et al 2015 Thin Solid Films 579 1
[13]	Jang Y H et al 1997 J. Electrochem. Soc. 144 3973
[14]	He H J et al 2014 ECS J. Solid State Sci. Technol. 3 Q74
[15]	Prenzel M et al 2013 J. Phys. D. Appl. Phys. 46 084004
[16]	Guo J M et al 2017 Plasma Sci. Technol. 19 075502
[17]	Yang P F et al 2017 Plasma Sci. Technol. 19 085504
[18]	Poolcharuansin P, Liebig B and Bradley J 2010 IEEE Trans. Plasma Sci. 38 3007
[19]	Anders A and Yushkov G Y 2009 J. Appl. Phys. 105 073301
[20]	Stranak V et al 2012 J. Appl. Phys. 112 093305
[21]	Va?ina P et al 2007 Plasma Sources Sci. Technol. 16 501
[22]	Kulisch W et al 2006 Appl. Phys. A 82 503
[23]	Huang S Y et al 2012 J. Appl. Phys. 111 036101
[24]	Huang F P et al 2013 Plasma Sci. Technol. 15 1197
[25]	Stranak V et al 2012 Surf. Coat. Technol. 206 2801
[26]	Stranak V et al 2011 Eur. Phys. J. D 64 427
[27]	Ostrikov K, Neyts E C and Meyyappan M 2013 Adv. Phys. 62 113
[28]	Godyak V A, Piejak R B and Alexandrovich B M 1991 IEEE Trans. Plasma Sci. 19 660
[29]	Depla D, Mahieu S and De Gryse R 2009 Thin Solid Films 517 2825
[30]	Tadjine R, Alim M M and Kechouane M 2017 Surf. Coat. Technol. 309 573
[31]	Xiang N 2004 Phys. Plasmas 11 4213
[32]	Taillet J 1969 Am. J. Phys. 37 423
[33]	Godyak V A and Popov O A 1979 Sov. J. Plasma Phys. 5 227
[34]	Chabert P and Braithwaite N 2011 Physics of Radio-Frequency Plasmas (New York: Cambridge University Press)

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