Citation: | Haiying WEI (魏海英), Hongge GUO (郭红革), Meili ZHOU (周美丽), Lei YUE (岳蕾), Qiang CHEN (陈强). DBD plasma assisted atomic layer deposition alumina barrier layer on self-degradation polylactic acid film surface[J]. Plasma Science and Technology, 2019, 21(1): 15503-015503. DOI: 10.1088/2058-6272/aae0ee |
[1] |
Hirvikorpi T et al 2010 Appl. Surf. Sci. 257 736
|
[2] |
Hirvikorpi T et al 2014 Thin Solid Films 550 164
|
[3] |
Johansson P 2014 Utilization of atomic layer deposition in packaging structures MSc Tampere Finland: Tampere University of Technology
|
[4] |
Hoffmann L et al 2016 J. Vac. Sci. Technol. A 34 01A114
|
[5] |
Tsai P A et al 2013 Polym. Plast. Technol. Eng. 52 1488
|
[6] |
Theirich D et al 2013 Chem. Vapor Depos. 19 167
|
[7] |
Johansson P et al 2010 Atomic layer deposition process for barrier applications of flexible packaging TAPPI Place Conf. (TAPPI 2010) (Albuquerque, NM)
|
[8] |
Lei W W et al 2012 Plasma Sci. Technol. 14 129
|
[9] |
Fang M et al 2017 Flexible Print. Electron. 2 022001
|
[10] |
Profijt H B et al 2011 J. Vac. Sci. Technol. A 29 050801
|
[11] |
Ha S C et al 2005 Thin Solid Films 476 252
|
[12] |
Carcia P F, McLean R S and Reilly M H 2010 Appl. Phys. Lett. 97 221901
|
[13] |
Verlaan V et al 2011 Phys. Status Solidi c 7 976
|
[14] |
Goldstein D N, McCormick J A and George S M 2008 J. Phys. Chem. C 112 19530
|
[15] |
K??ri?inen T O et al 2010 Plasma Process. Polym. 6 S237
|
[16] |
Scarpulla M A et al 2008 Appl. Phys. Lett. 92 173116
|
[17] |
Meyer D C, Levin A A and Paufler P 2005 Thin Solid Films 489 5
|
[18] |
Zhang L et al 2007 J. Phys. D: Appl. Phys. 40 3707
|
[19] |
Xiong Y Q et al 2013 Plasma Sci. Technol. 15 52
|
[20] |
Dai X M et al 2013 Appl. Phys. Lett. 103 151602
|
[21] |
Tripp M K et al 2006 Sensors Actuators A 130-131 419
|
[22] |
Fang M 2015 The study of plasma assistance on TMA catalyzing TPS for SiO 2 MSc Beijing China: Beijing Institute of Graphic Communication (in Chinese)
|
[23] |
Klaus J W, Sneh O and George S M 1997 Science 278 1934
|
[24] |
Groner M D et al 2004 Chem. Mater. 16 639
|
[25] |
Marra A et al 2016 Int. J. Biol. Macromol. 88 254
|
[1] | Kang AN (安康), Liangxian CHEN (陈良贤), Jinlong LIU (刘金龙), Yun ZHAO (赵云), Xiongbo YAN (闫雄伯), Chenyi HUA (化称意), Jianchao GUO (郭建超), Junjun WEI (魏俊俊), Lifu HEI (黑立富), Chengming LI (李成明), Fanxiu LU (吕反修). The effect of substrate holder size on the electric field and discharge plasma on diamond-film formation at high deposition rates during MPCVD[J]. Plasma Science and Technology, 2017, 19(9): 95505-095505. DOI: 10.1088/2058-6272/aa7458 |
[2] | Ling ZHANG (张玲), Guo CHEN (陈果), Zhibing HE (何智兵), Xing AI (艾星), Jinglin HUANG (黄景林), Lei LIU (刘磊), Yongjian TANG (唐永建), Xiaoshan HE (何小珊). Investigation of working pressure on the surface roughness controlling technology of glow discharge polymer films based on the diagnosed plasma[J]. Plasma Science and Technology, 2017, 19(7): 75505-075505. DOI: 10.1088/2058-6272/aa6618 |
[3] | Jiaojiao LI (李娇娇), Qianghua YUAN (袁强华), Xiaowei CHANG (常小伟), Yong WANG (王勇), Guiqin YIN (殷桂琴), Chenzhong DONG (董晨钟). Deposition of organosilicone thin film from hexamethyldisiloxane (HMDSO) with 50kHz/ 33MHz dual-frequency atmospheric-pressure plasma jet[J]. Plasma Science and Technology, 2017, 19(4): 45505-045505. DOI: 10.1088/2058-6272/aa57e4 |
[4] | QI Xiaohua (齐晓华), YANG Liang (杨亮), YAN Huijie (闫慧杰), JIN Ying (金英), HUA Yue (滑跃), REN Chunsheng (任春生). Experimental Study on Surface Dielectric Barrier Discharge Plasma Actuator with Different Encapsulated Electrode Widths for Airflow Control at Atmospheric Pressure[J]. Plasma Science and Technology, 2016, 18(10): 1005-1011. DOI: 10.1088/1009-0630/18/10/07 |
[5] | PENG Shi (彭释), LI Lingjun (李灵均), LI Wei (李炜), WANG Chaoliang (王超梁), GUO Ying (郭颖), SHI Jianjun (石建军), ZHANG Jing (张菁). Surface Modification of Polyimide Film by Dielectric Barrier Discharge at Atmospheric Pressure[J]. Plasma Science and Technology, 2016, 18(4): 337-341. DOI: 10.1088/1009-0630/18/4/01 |
[6] | NIU Jinhai(牛金海), ZHANG Zhihui(张志慧), FAN Hongyu(范红玉), YANG Qi(杨杞), LIU Dongping(刘东平), QIU Jieshan(邱介山). Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Films by Dielectric Barrier Discharge in TiCl 4 /O 2 /N 2 Gas Mixtures[J]. Plasma Science and Technology, 2014, 16(7): 695-700. DOI: 10.1088/1009-0630/16/7/11 |
[7] | WANG Xiaomin(王晓敏), YUAN Qianghua(袁强华), ZHOU Yongjie(周永杰), YIN Guiqin(殷桂琴), DONG Chenzhong(董晨钟). Deposition of Polymer Thin Film Using an Atmospheric Pressure Micro-Plasma Driven by Dual-Frequency Excitation[J]. Plasma Science and Technology, 2014, 16(1): 68-72. DOI: 10.1088/1009-0630/16/1/15 |
[8] | DI Lanbo, LI Xiaosong, ZHAO Tianliang, CHANG Dalei, LIU Qianqian, ZHU Aimin. Tuning Effect of N2 on Atmospheric-Pressure Cold Plasma CVD of TiO2 Photocatalytic Films[J]. Plasma Science and Technology, 2013, 15(1): 64-69. DOI: 10.1088/1009-0630/15/1/11 |
[9] | WANG Changquan (王长全), ZHANG Guixin (张贵新), WANG Xinxin (王新新). Surface Treatment of Polypropylene Films Using Dielectric Barrier Discharge with Magnetic Field[J]. Plasma Science and Technology, 2012, 14(10): 891-896. DOI: 10.1088/1009-0630/14/10/07 |
[10] | H. Martínez, O. Flores, J. C. Poveda, B. Campillo. Asphaltene Erosion Process in Air Plasma: Emission Spectroscopy and Surface Analysis for Air-Plasma Reactions[J]. Plasma Science and Technology, 2012, 14(4): 303-311. DOI: 10.1088/1009-0630/14/4/07 |
1. | Zhang, X., Wang, J., Wang, F. et al. Particle Simulation of Positive Streamer Discharges on Surface of DC Transmission Conductors with Coating Materials. IEEE Transactions on Plasma Science, 2022, 50(10): 3751-3759. DOI:10.1109/TPS.2022.3202648 |
2. | Kim, S.-J., Kim, S., Son, B.-K. et al. Ozone-Generation Panel with an Atmospheric Dielectric Barrier Discharge. Journal of the Korean Physical Society, 2020, 77(7): 572-581. DOI:10.3938/jkps.77.572 |
3. | Lee, K.-H., Kim, S., Jo, H. et al. Plasma skincare device based on floating electrode dielectric barrier discharge. Plasma Science and Technology, 2019, 21(12): 125403. DOI:10.1088/2058-6272/ab428a |