Numerical analysis of thermal plasma scrubber for CF<sup><sub>4</sub></sup> decomposition

J KO; T H KIM; S CHOI

doi:10.1088/2058-6272/aafbba

Plasma Science and Technology > 2019 > 21(6): 64002-064002. > DOI: 10.1088/2058-6272/aafbba

J KO, T H KIM, S CHOI. Numerical analysis of thermal plasma scrubber for CF^₄ decomposition[J]. Plasma Science and Technology, 2019, 21(6): 64002-064002. DOI: 10.1088/2058-6272/aafbba

Citation:

J KO, T H KIM, S CHOI. Numerical analysis of thermal plasma scrubber for CF^₄ decomposition[J]. Plasma Science and Technology, 2019, 21(6): 64002-064002. DOI: 10.1088/2058-6272/aafbba

Citation:

J KO, T H KIM, S CHOI. Numerical analysis of thermal plasma scrubber for CF^₄ decomposition[J]. Plasma Science and Technology, 2019, 21(6): 64002-064002. DOI: 10.1088/2058-6272/aafbba

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Numerical analysis of thermal plasma scrubber for CF^₄ decomposition

J KO¹,
T H KIM^2,3,
S CHOI^1,2,3

¹ Department of Nuclear and Energy Engineering, Jeju National University, Jeju 63243, Republic of Korea
² Institute for Nuclear Science and Technology, Jeju National University, Jeju 63243, Republic of Korea

Funds: This project is supported by the ‘R&D Center for Reduction of Non-CO₂ Greenhouse Gases (2017002430003)’ funded by the Korea Ministry of Environment (MOE) as ‘Global Top Environment R&D Program’ and National Research Foundation of Republic of Korea (NRF-2015 M2B2A9030393).

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Received Date: September 21, 2018

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Abstract

Abstract

CF₄ gas emitted in the semiconductor and display manufacturing process is a very harmful greenhouse gas. It must be removed or converted safely due to its extreme toxicity. Although a CF₄ decomposition system using a thermal plasma scrubber was commercialized, its removal efficiency is limited. In this work, a numerical analysis of CF₄ decomposition in the thermal plasma scrubber was carried out in order to propose an efficient decomposition environment. The decomposition and recombination temperatures of CF₄ were analyzed using thermodynamic equilibrium calculations. The chemical reaction of CF₄ decomposition into carbon and fluorine gas was considered in this numerical analysis. The injection position and angle of the CF₄ were controlled in order to enhance the decomposition rate. The vertical injection of CF₄ near the torch exit improved the mixing of the CF₄ with the thermal plasma flame. In addition, it was confirmed that the high temperature region expanded due to a vortex generated by strong turbulence in the bottleneck-shaped reactor. As a result, it is revealed that the CF₄ injection location and the reactor configuration are the most important factors in improving the decomposition rate.
- numerical simulation,
- decomposition,
- CF₄,
- thermal plasma,
- scrubber

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References (33)

References

[1]	Chang J P and Coburn J B 2003 J. Vac. Sci. Technol. A 21 S145
[2]	Allgood C C 2003 J. Fluorine Chem. 122 105
[3]	Namose I 2003 IEEE Trans. Semicond. Manuf. 16 429
[4]	Tsai W T, Chen H P and Hsien W Y 2002 J. Loss Prev. Process Ind. 15 65
[5]	Gompel J V 2000 Semicon. Int. 23 321
[6]	Venkataramani N 2002 Curr. Sci. 83 254
[7]	Choi S 2009 Improvement of CF 4 Pyrolysis Process by Using a Plasma Torch with Hollow Electrodes [PhD] Seoul National University
[8]	Jia L and Li J S 2004 J. Therm. Sci. 13 366
[9]	Xie H D, Sun B and Zhu X M 2009 J. Hazard. Mater. 168 765
[10]	Radoiu M T 2004 Radiat. Phys. Chem. 69 113
[11]	Sikdar S K, Burckle J and Rogut J 2001 Environ. Prog. 20 1
[12]	Müller E A 2005 Environ. Sci. Technol. 39 8736
[13]	Ahn N G et al 2006 J. Chem. Eng. Data 51 451
[14]	Park D W 1988 A Study of Particle Heating by a Thermal Plasma a Flow Confined in a Tube [PhD] Tokyo Institute of Technology (in Japanese)
[15]	Benocci R, Bonizzoni G and Sindoni E 1996 Thermal Plasmas for Hazardous Waste Treatment (Singapore: World Scientific)
[16]	Pfender E 1999 Plasma Chem. Plasma Proc. 19 1
[17]	Park H W, Cha B and Uhm S 2018 Appl. Chem. Eng. 29 10 (in Korean)
[18]	Sun J W and Park D W 2003 Korean J. Chem. Eng. 20 476
[19]	Kim D Y and Park D W 2008 Surface Coat. Technol. 202 5280
[20]	Kim K S 2005 Three-dimensional and Turbulent Nature of Arc Discharge Phenomena Inside a Plasma Torch with Hollow Electrodes For Thermal Plasma Processing [PhD] Seoul National University
[21]	Choi S et al 2012 Chem. Eng. J. 185–186 193
[22]	Choi S, Park D W and Watanabe T 2012 Nucl. Eng. Technol. 44 21
[23]	Choi S et al 2011 J. Therm. Sci. Technol. 6 210
[24]	Hur M and Hong S H 2002 J. Phys. D: Appl. Phys. 35 1946
[25]	Murphy A B and Arundelli C J 1994 Plasma Chem. Plasma Proc. 14 451
[26]	Scott D A, Kovitya P and Haddad G N 1989 J. Appl. Phys. 66 5232
[27]	Paik S et al 1993 Plasma Chem. Plasma Proc. 13 379
[28]	Choi S et al 2009 J. Korean Phys. Soc. 55 1819
[29]	Kang K D and Hong S H 1996 IEEE Trans. Plasma Sci. 24 89
[30]	Launder B E and Spalding D B 1974 Comp. Methods Appl. Mech. Eng. 31 269
[31]	Kim T H, Choi S and Park D W 2012 Curr. Appl. Phys. 12 509
[32]	Arabzadeh Esfarjani S et al 2012 J. Phys.: Conf. Ser. 406 012011
[33]	Modica A P and Sillers S J 1968 J. Chem. Phys. 48 3283

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Numerical analysis of thermal plasma scrubber for CF^₄ decomposition