Effects of inter-electrode insertion on the performance and thermal flow fields of a hollow-electrode plasma torch

In-Mok YANG; Jun-Seok NAM; Min-Kyu CHOI; Jun-Ho SEO; Shi-Young YANG

doi:10.1088/2058-6272/ab4922

Plasma Science and Technology > 2020 > 22(1): 15403-015403. > DOI: 10.1088/2058-6272/ab4922

In-Mok YANG, Jun-Seok NAM, Min-Kyu CHOI, Jun-Ho SEO, Shi-Young YANG. Effects of inter-electrode insertion on the performance and thermal flow fields of a hollow-electrode plasma torch[J]. Plasma Science and Technology, 2020, 22(1): 15403-015403. DOI: 10.1088/2058-6272/ab4922

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Effects of inter-electrode insertion on the performance and thermal flow fields of a hollow-electrode plasma torch

¹ Department of Applied Plasma Engineering, Chonbuk National University, Jeonju 54896, Republic of Korea
² Graduate School of Flexible & Printable Electronics, Chonbuk National University, Jeonju 54896, Republic of Korea

Funds: This research was supported by the Technology Development Program to Solve Climate Changes of the National Research Foundation (NRF) funded by the Ministry of Science and ICT (NRF-2016M1A2A2940152).

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Received Date: April 20, 2019
Revised Date: September 26, 2019
Accepted Date: September 29, 2019

Graphical Abstract

Abstract

Abstract

The effects of inter-electrode insertion on the performance of a hollow-electrode plasma torch have been investigated by numerical analysis. Simulation results revealed that when inter-electrodes are inserted, the arc voltages and plasma powers increase due to the increase in the arc length. In addition, it was predicted that thermal efficiency can be improved with the increase in plasma power by injecting plasma gases through the gaps between inter-electrodes. These unique effects of inter-electrode insertion are a result of the plasma temperatures adjusting themselves to increase arc voltages when the arc column is contracted radially by increasing gas-flow rate or decreasing inter-electrode diameter.
- hollow-electrode plasma torch,
- inter-electrodes,
- numerical analysis,
- torch performance

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References (22)

References

[1]	Heberlein J and Murphy A B 2008 J. Phys. D: Appl. Phys. 41 053001
[2]	Murata M et al 2005 Nippon Steel Tech. Rep. 92 30 (www.nipponsteel.com/en/tech/report/nsc/pdf/n9206.pdf )
[3]	Minutillo M, Perna A and Bona D D 2009 Energy Convers.Manag. 50 2837
[4]	Chang J S 2009 Int. J. Plasma Environ. Sci. Technol. 3 67
[5]	Tzeng C C et al 1998 J. Hazard. Mater. 58 207
[6]	Deckers J 2014 The innovative plasma tilting furnace for industrial treatment of radioactive waste-14420 WM2014 Conf. Proc. (Phoenix, Arizona, 2–6 March 2014) (Tempe AZ: WM Symposia Inc.)
[7]	Fauchais P and Vardelle A 1997 IEEE Trans. Plasma Sci.25 1258
[8]	Krogh O, Carlile R N and Nowlin R N 1995 Plasma Chem.Plasma Process. 15 231
[9]	Garam J 2013 A study on design and manufacture of arc heater facility using computational fluid dynamics PhD Thesis Seoul National University (http://dcollection.snu.ac.kr/public_resource/pdf/000000012993_20191015233902.pdf )
[10]	Santen S et al 1985 Means for electrically heating gases US Patent No. 4543470US Patent and Trademark Office (https://patentimages.storage.googleapis.com/bc/b5/51/0fd180fce1e7f0/US4543470.pdf )
[11]	Patankar S V 1980 Computational Fluid Flow and Heat Transfer (New York: McGraw-Hill)
[12]	Trelles J P et al 2009 J. Therm. Spray Technol. 18 728
[13]	Launder B E and Spalding D B 1974 Comput. Methods Appl.Mech. Eng. 3 269
[14]	Boulos M I, Fauchais P and Wender E 1994 Thermal Plasmas:Fundamentals and Applications vol 1 (New York: Plenum Press)
[15]	Trelles J P, Pfender E and Heberlein J V R 2007 J. Phys. D: Appl. Phys. 40 5635
[16]	Hur M and Hong S H 2002 J. Phys. D: Appl. Phys. 35 1946
[17]	Paik S et al 1993 Plasma Chem. Plasma Process. 13 379
[18]	Hirsh M N and Oskam H J 1978 Gaseous Electronics: Electrical Discharges (New York: Academic)
[19]	Yang I M et al 2019 J. Korean Phys. Soc. 74 465
[20]	Sun H et al 2016 J. Phys. D: Appl. Phys. 49 055204
[21]	Wu Y et al 2016 J. Phys. D: Appl. Phys. 49 425202
[22]	Shaeffer J F 1978 AIAA J. 16 1068

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