Multiple current peaks and spatial characteristics of atmospheric helium dielectric barrier discharges with repetitive unipolar narrow pulse excitation

Xiangyu ZHOU (周翔宇); Qiao WANG (王乔); Dong DAI (戴栋); Zeen HUANG (黄泽恩)

doi:10.1088/2058-6272/abea72

Plasma Science and Technology > 2021 > 23(6): 64003-064003. > DOI: 10.1088/2058-6272/abea72

Xiangyu ZHOU (周翔宇), Qiao WANG (王乔), Dong DAI (戴栋), Zeen HUANG (黄泽恩). Multiple current peaks and spatial characteristics of atmospheric helium dielectric barrier discharges with repetitive unipolar narrow pulse excitation[J]. Plasma Science and Technology, 2021, 23(6): 64003-064003. DOI: 10.1088/2058-6272/abea72

Citation:

PDF (1172 KB)

Multiple current peaks and spatial characteristics of atmospheric helium dielectric barrier discharges with repetitive unipolar narrow pulse excitation

School of Electric Power, South China University of Technology, Guangzhou 510641, People's Republic of China

Funds: This work is supported by National Natural Science Foundation of China (No. 51877086).

More Information

Received Date: December 03, 2020
Revised Date: February 23, 2021
Accepted Date: February 25, 2021

Graphical Abstract

Abstract

Abstract

Atmospheric dielectric barrier discharges driven by repetitive unipolar narrow pulse excitation are investigated numerically by using one-dimensional fluid models. The one-dimensional simulation focuses on the effects of applied voltage amplitude, pulse repetition frequency, gap width and γ coefficient on the multiple-current-pulse (MCP) discharge. The results indicate that the MCP behavior will lead to the stratification of electron density distribution in axial direction. Traditional MCP manipulating methods, such as reducing the applied voltage amplitude, increasing the applied voltage frequency, adjusting the gap width, cannot regulate MCPs exhibiting in this work. Further analyses reveal that the increasing electric field of the cathode fall region is the basis for the emergence of MCP behavior.
- dielectric barrier discharges,
- narrow pulse excitation,
- multiple-current-pulse discharge,
- electric field,
- cathode fall region

FullText(HTML)

References (80)

References

[1]	Fang Z et al 2017 IEEE Trans. Plasma Sci. 45 310
[2]	Nguyen H P et al 2018 J. Clean. Prod. 198 1232
[3]	Shao T et al 2010 Appl. Surf. Sci. 256 3888
[4]	Zhen Y et al 2018 High Volt. 3 154
[5]	Chen Q et al 2020 High Volt. Eng. 46 3715 (in Chinese)
[6]	Yang Y et al 2020 High Volt. Eng. 46 4355 (in Chinese)
[7]	Miao C et al 2019 High Volt. Eng. 45 1945 (in Chinese)
[8]	Golubovskii Y B et al 2002 J. Phys. D: Appl. Phys. 36 39
[9]	Shin J et al 2003 J. Appl. Phys. 94 7408
[10]	Zhang Y et al 2008 Thin Solid Films 516 7547
[11]	Zhang Y et al 2018 AIP Adv. 8 035008
[12]	Zhang Y et al 2019 Plasma Sources Sci. Technol. 28 104001
[13]	Zhang Y et al 2019 J. Phys. D: Appl. Phys. 52 045203
[14]	Walsh J L et al 2012 Plasma Sources Sci. Technol. 21 034008
[15]	Brauer I et al 1999 J. Appl. Phys. 85 7569
[16]	Hao Y et al 2014 Phys. Plasmas 21 013503
[17]	Wan J et al 2019 Phys. Plasmas 26 103510
[18]	Wang Q et al 2019 J. Phys. D: Appl. Phys. 52 205201
[19]	Zhang Y et al 2019 Plasma Sources Sci. Technol. 28 075003
[20]	Zhang Y et al 2005 Phys. Plasmas 12 103508
[21]	Zhao Z et al 2020 High Volt. 5 569
[22]	Ayan H et al 2008 IEEE Trans. Plasma Sci. 36 504
[23]	Bozhko I V et al 2017 IEEE Trans. Plasma Sci. 45 3064
[24]	Guo H et al 2018 Phys. Plasmas 25 093505
[25]	Laroussi M et al 2004 J. Appl. Phys. 96 3028
[26]	Zhang S et al 2019 Spectrochim. Acta A 207 294
[27]	Shao T et al 2018 High Volt. 3 14
[28]	Liu S et al 2001 J. Phys. D: Appl. Phys. 34 1632
[29]	Truong H T et al 2019 Japan. J. Appl. Phys. 58 111001
[30]	Xu Y et al 2020 Plasma Sci. Technol. 22 055403
[31]	Tang J et al 2019 Plasma Sci. Technol. 21 044001
[32]	Wei L et al 2018 Plasma Sci. Technol. 20 125505
[33]	Shao T et al 2008 J. Phys. D: Appl. Phys. 41 215203
[34]	Shao T et al 2010 IEEE Trans. Dielectr. Electr. Insul. 17 1830
[35]	Chen B et al 2011 IEEE Trans. Plasma Sci. 39 1949
[36]	Bletzinger P et al 2003 J. Phys. D: Appl. Phys. 36 1550
[37]	Gao K et al 2019 AIP Adv. 9 115210
[38]	Chen B et al 2012 Vacuum 86 1992
[39]	Borcia G et al 2009 Rom. J. Phys. 54 689
[40]	Bogdanov E A et al 2006 Contrib. Plasma Phys. 46 807
[41]	Huang X et al 2011 Thin Solid Films 519 7036
[42]	Shao T et al 2013 J. Appl. Phys. 113 093301
[43]	Yu S et al 2016 Phys. Plasmas 23 023510
[44]	Zhang P et al 2005 J. Phys. D: Appl. Phys. 39 153
[45]	Stollenwerk L et al 2006 Phys. Rev. Lett. 96 255001
[46]	Huang Z et al 2015 Phys. Plasmas 22 123509
[47]	Bhoj A N et al 2011 IEEE Trans. Plasma Sci. 39 2152
[48]	Wang Q et al 2011 Phys. Plasmas 18 103504
[49]	Stewart R A et al 1991 J. Appl. Phys. 70 3481
[50]	Petra C G et al 2014 Comput. Sci. Eng. 16 32
[51]	Wang Q et al 2020 Plasma Process. Polym. 17 1900182
[52]	Plasma module of COMSOL Multiphysics http://comsol.com/plasma-module/
[53]	Lazarou C et al 2016 Plasma Sources Sci. Technol. 25 055023
[54]	Hagelaar G J M et al 2005 Plasma Sources Sci. Technol.14 722
[55]	Purwins H G et al 2014 Plasma Phys. Control. Fusion 56 123001
[56]	Raizer Y P et al 1991 Gas Discharge Physics (Berlin:Springer)
[57]	Ellis H W et al 1976 At. Data Nucl. Data Tables 17 177
[58]	Zhang J et al 2018 IEEE Trans. Plasma Sci. 46 19
[59]	Iza F et al 2009 IEEE Trans. Plasma Sci. 37 1289
[60]	Lu X et al 2008 Appl. Phys. Lett. 92 051501
[61]	Donkó Z et al 2011 Appl. Phys. Lett. 98 251502
[62]	Zhang Y et al 2018 Phys. Plasmas 25 023509
[63]	Zhang Y et al 2018 AIP Adv. 8 095327
[64]	Zhang D et al 2012 Phys. Plasmas 19 123511
[65]	Lu X et al 2009 IEEE Trans. Plasma Sci. 37 647
[66]	Ning W et al 2017 Phys. Plasmas 24 073509
[67]	Dai D et al 2011 Appl. Phys. Lett. 98 131503
[68]	Nikandrov D S et al 2008 IEEE Trans. Plasma Sci. 36 131
[69]	Levko D et al 2019 Phys. Plasmas 26 064502
[70]	Huang B et al 2013 J. Phys. D: Appl. Phys. 46 464011
[71]	Wang C et al 2019 Phys. Plasmas 26 123506
[72]	Nikandrov D S 2005 Tech. Phys. 50 1284
[73]	Kolobov V I 2013 Phys. Plasmas 20 101610
[74]	Golubovskii Y B et al 2003 J. Phys. D: Appl. Phys. 36 975
[75]	Akishev Y S et al 2001 Plasma Phys. Rep. 27 164
[76]	Wang D et al 2006 Thin Solid Films 506–507 384
[77]	Petrović D et al 2009 J. Phys. D: Appl. Phys. 42 205206
[78]	Massines F et al 2003 Surf. Coat. Technol. 174–175 8
[79]	Massines F et al 2005 Plasma Phys. Control. Fusion 47B577
[80]	Golubovskii Y B et al 2002 J. Phys. D: Appl. Phys. 35 751