Advanced Search+
Qi LIU, Zian WEI, Jinxiu MA, Kaiyang YI, Wan TAO, Zhengyuan LI. Electron sheaths near a positively biased plate subjected to a weak electron beam[J]. Plasma Science and Technology, 2023, 25(3): 035403. DOI: 10.1088/2058-6272/ac9721
Citation: Qi LIU, Zian WEI, Jinxiu MA, Kaiyang YI, Wan TAO, Zhengyuan LI. Electron sheaths near a positively biased plate subjected to a weak electron beam[J]. Plasma Science and Technology, 2023, 25(3): 035403. DOI: 10.1088/2058-6272/ac9721

Electron sheaths near a positively biased plate subjected to a weak electron beam

  • Electron sheaths have previously only been measured near a positively biased small electrode, in which a potential dip was often observed. In this paper, we present an experimental study on the electron sheath near a stainless steel plate in the presence of a weak electron beam. It is shown that the electron beam, though its density is much lower than that of the background plasma, will substantially alter the sheath structure, i.e., it causes the disappearance of the potential dip when the beam energy just exceeds the ionization potential of the neutral gas but later enhances the dip for higher energies. It is also shown that proper biases on the plate and chamber wall are the key to the formation of the electron sheath and the dip. For a fixed plate bias but with different electron beam energy, the measured thickness of the ion-free Child–Langmuir sheath agrees well with that of the theoretical model.
  • loading

Catalog

    Turn off MathJax
    Article Contents

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return