Enhancing surface adhesion of polytetrafluoroethylene induced by two-step in-situ treatment with radiofrequency capacitively coupled Ar/Ar+CH4+NH3 plasma

Manting LU; Yi HE; Xue LIU; Jiamin HUANG; Jiawei ZHANG; Xiaoping MA; Yu XIN

doi:10.1088/2058-6272/acd528

Plasma Science and Technology > 2023 > 25(10): 105503. > DOI: 10.1088/2058-6272/acd528

Manting LU, Yi HE, Xue LIU, Jiamin HUANG, Jiawei ZHANG, Xiaoping MA, Yu XIN. Enhancing surface adhesion of polytetrafluoroethylene induced by two-step in-situ treatment with radiofrequency capacitively coupled Ar/Ar+CH₄+NH₃ plasma[J]. Plasma Science and Technology, 2023, 25(10): 105503. DOI: 10.1088/2058-6272/acd528

Citation:

PDF (1463 KB)

Enhancing surface adhesion of polytetrafluoroethylene induced by two-step in-situ treatment with radiofrequency capacitively coupled Ar/Ar+CH₄+NH₃ plasma

Jiangsu Key Laboratory of Thin Films, School of Physical Science and Technology, Soochow University, Suzhou 215006, People's Republic of China

More Information

Corresponding author:
Yu XIN, E-mail:yuxin@suda.edu.cn
Received Date: February 03, 2023
Revised Date: May 08, 2023
Accepted Date: May 11, 2023
Available Online: December 05, 2023
Published Date: July 06, 2023

Graphical Abstract

Abstract

Abstract

Although some progress in plasma modification of the polytetrafluoroethylene (PTFE) surface has been made recently, its adhesion strength still needs to be further improved. In this work, the surface of a PTFE sample was treated with a two-step in-situ method. Firstly, the PTFE surface was treated with capacitively coupled Ar plasma to improve its mechanical interlocking performance; then, Ar+NH₃+CH₄ plasma was used to deposit an a-CN_x:H cross-linking layer on the PTFE surface to improve the molecular bonding ability. After treatment, a high specific surface area of 2.20 and a low F/C ratio of 0.32 were achieved on the PTFE surface. Its surface free energy was increased significantly and its maximum adhesion strength reached 77.1 N−10 mm⁻¹, which is 56% higher than that of the single-step Ar plasma-treated sample and 32% higher than that of the single-step Ar+CH₄+NH₃ plasma-treated sample.
- adhesion property,
- surface modification,
- capacitively coupled plasma,
- polytetrafluoroethylene

FullText(HTML)

References (46)

References

[1]	Vesel A et al 2020 Polymers 12 2855 doi: 10.3390/polym12122855
[2]	Wei Q F et al 2007 Surf. Rev. Lett. 14 821 doi: 10.1142/s0218625x0701010x
[3]	Liu K et al 2018 Appl. Surf. Sci. 458 183 doi: 10.1016/j.apsusc.2018.07.061
[4]	Wu S et al 2000 Langmuir 16 5192 doi: 10.1021/la9914211
[5]	Marchesi J T et al 1991 J. Adhes. 36 55 doi: 10.1080/00218469108026523
[6]	Hori K et al 2019 IEEE Trans. Ind. Appl. 55 825 doi: 10.1109/tia.2018.2868035
[7]	Rye R R 1994 J. Polym. Sci., Part B:Polym. Phys. 32 1777 doi: 10.1002/polb.1994.090321010
[8]	Ye Y and Guo T L 2009 Trans. Inst. Met. Finish. 87 217 doi: 10.1179/174591909x438866
[9]	Nasef M M et al 2000 J. Appl. Polym. Sci. 76 336 doi: 10.1002/(SICI)1097-4628(20000418)76:3<336::AID-APP9>3.0.CO;2-E
[10]	Zanini S et al 2014 J. Phys. D:Appl. Phys. 47 325202 doi: 10.1088/0022-3727/47/32/325202
[11]	Vijayan V M et al 2020 J. Mat. Chem. B 8 2814 doi: 10.1039/C9TB02757B
[12]	Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing (New YorkWiley)
[13]	Lee S W et al 2004 Nucl. Instrum. Methods Phys. Res., Sect. B 219 963 doi: 10.1016/j.nimb.2004.01.197
[14]	Pachchigar V et al 2022 Plasma Process Polym. 19 2200037 doi: 10.1002/ppap.202200037
[15]	Bilek M M M et al 2020 Appl. Surf. Sci. 518 146128 doi: 10.1016/j.apsusc.2020.146128
[16]	Ohkubo Y et al 2020 J. Adhes. 96 776 doi: 10.1080/00218464.2018.1512859
[17]	Ohkubo Y et al 2017 Sci. Rep. 7 9476 doi: 10.1038/s41598-017-09901-y
[18]	Zhou Y et al 2020 J. Ind. Text. 50 364 doi: 10.1177/1528083719830148
[19]	Xu Q et al 2012 J. Membr. Sci. 415 435 doi: 10.1016/j.memsci.2012.05.031
[20]	Chen J R and Wakida T 1997 J. Appl. Polym. Sci. 63 1733 doi: 10.1002/(sici)1097-4628(19970328)63:133C1733::aid-app43E3.0.co;2-h
[21]	Hai W F et al 2015 J. Photopolym. Sci. Technol. 28 479 doi: 10.2494/photopolymer.28.479
[22]	Inagaki N, Tasaka S and Kawai H 1989 J. Adhes. Sci. Technol. 3 637 doi: 10.1163/156856189X00461
[23]	Progeb R 2017 J. Polym. Sci., Part B:Polym. Phys. 55 198 doi: 10.1002/polb.24260
[24]	Kolsk Z et al 2012 Vacuum 86 643 doi: 10.1016/j.vacuum.2011.07.015
[25]	Yang G H, Kang E T and Neoh K G 2001 J. Adhes. Sci. Technol. 15 727 doi: 10.1163/156856101750430459
[26]	Okubo M et al 2010 IEEE Trans. Ind. Appl. 46 1715 doi: 10.1109/tia.2010.2057492
[27]	Zhang M C et al 2001 Colloids Surf. Physicochem. Eng. Aspects. 176 139 doi: 10.1016/S0927-7757(00)00691-9
[28]	Zhang M C et al 2001 J. Electrochem. Soc. 148 C71 doi: 10.1149/1.1337609
[29]	Zhang L H, Chen Y S and Dong T 2004 Surf. Interface Anal. 36 311 doi: 10.1002/sia.1684
[30]	Cheng C Y et al 2020 Plasma Chem. Plasma Process. 40 1507 doi: 10.1007/s11090-020-10112-z
[31]	Yu Z J et al 2001 Surf. Coat. Technol. 138 48 doi: 10.1016/S0257-8972(00)01131-2
[32]	Hegemann D et al 2016 Langmuir 32 651 doi: 10.1021/acs.langmuir.5b03913
[33]	Cao L Y et al 2021 Acta Phys. Sin. 70 115204(in Chinese) doi: 10.7498/aps.70.20202113
[34]	Kuo M T et al 2000 Int. J. Mod. Phys. B14 295 doi: 10.1142/s0217979200000297
[35]	Awaja F et al 2009 Prog. Polym. Sci. 34 948 doi: 10.1016/j.progpolymsci.2009.04.007
[36]	Chen M et al 2003 J. Appl. Polym. Sci. 89 1875 doi: 10.1002/app.12490
[37]	Vesel A et al 2008 Surf. Interface Anal. 40 1444 doi: 10.1002/sia.2923
[38]	Ravi S et al 2018 J. Ind. Eng. Chem. 67 210 doi: 10.1016/j.jiec.2018.06.031
[39]	Navik R et al 2018 Plasma Sci. Technol. 20 065504 doi: 10.1088/2058-6272/aaaadd
[40]	Liu H and Liu Y 2012 Plasma Sci. Technol. 14 728 doi: 10.1088/1009-0630/14/8/09
[41]	Sprang N, Theirich D and Engemann J 1995 Surf. Coat. Technol. 74 689 doi: 10.1016/0257-8972(95)08340-5
[42]	Mortazavi M and Nosonovsky M 2012 Appl. Surf. Sci. 258 6876 doi: 10.1016/j.apsusc.2012.03.122
[43]	Zorba V et al 2008 Adv. Mater. 20 4049 doi: 10.1002/adma.200800651
[44]	Hyun J et al 2000 J. Appl. Polym. Sci. 77 1679 doi: 10.1002/1097-4628(20000822)77:8<1679::AID-APP4>3.0.CO;2-F
[45]	Wolansky G and Marmur A 1999 Colloids Surf. Physicochem. Eng. Aspects. 156 381 doi: 10.1016/S0927-7757(99)00098-9
[46]	Brandon S et al 2003 J. Colloid Interface Sci. 263 237 doi: 10.1016/S0021-9797(03)00285-6

[1]	Pengyu WANG, Siyu XING, Daoman HAN, Yuru ZHANG, Yong LI, Cheng ZHOU, Fei GAO, Younian WANG. Effects of external parameters on plasma characteristics and uniformity in a dual cylindrical inductively coupled plasma[J]. Plasma Science and Technology, 2024, 26(12): 125401. DOI: 10.1088/2058-6272/ad73aa
[2]	Na LI, Daoman HAN, Quanzhi ZHANG, Xuhui LIU, Yingjie WANG, Younian WANG. Fluid simulation of the effect of a dielectric window with high temperature on plasma parameters in inductively coupled plasma[J]. Plasma Science and Technology, 2023, 25(3): 035401. DOI: 10.1088/2058-6272/ac92ce
[3]	Xiaoyan SUN (孙晓艳), Yuru ZHANG (张钰如), Jing YE (叶静), Younian WANG (王友年), Jianxin HE (何建新). Modulation of the plasma uniformity by coil and dielectric window structures in an inductively coupled plasma[J]. Plasma Science and Technology, 2021, 23(9): 95404-095404. DOI: 10.1088/2058-6272/ac0c6b
[4]	Zeyu HAO (郝泽宇), JianSONG(宋健), YueHUA(滑跃), Gailing ZHANG (张改玲), Xiaodong BAI (白晓东), Chunsheng REN (任春生). Frequency dependence of plasma characteristics at different pressures in cylindrical inductively coupled plasma source[J]. Plasma Science and Technology, 2019, 21(7): 75401-075401. DOI: 10.1088/2058-6272/ab1035
[5]	Yan HUI (辉妍), Na LU (鲁娜), Pengzhen LUO (罗朋振), Kefeng SHANG (商克峰), Nan JIANG (姜楠), Jie LI (李杰), Yan WU (吴彦). Classification and uniformity optimization of mesh-plate DBD and its application in polypropylene modification[J]. Plasma Science and Technology, 2019, 21(5): 54006-054006. DOI: 10.1088/2058-6272/aafae1
[6]	Jun DENG (邓俊), Liming HE (何立明), Xingjian LIU (刘兴建), Yi CHEN (陈一). Numerical simulation of plasma-assisted combustion of methane-air mixtures in combustion chamber[J]. Plasma Science and Technology, 2018, 20(12): 125502. DOI: 10.1088/2058-6272/aacdef
[7]	Yue HUA (滑跃), Jian SONG (宋健), Zeyu HAO (郝泽宇), Gailing ZHANG (张改玲), Chunsheng REN (任春生). Effects of direct current discharge on the spatial distribution of cylindrical inductivelycoupled plasma at different gas pressures[J]. Plasma Science and Technology, 2018, 20(1): 14005-014005. DOI: 10.1088/2058-6272/aa8ea8
[8]	ZHANG Zhihui(张志辉), WU Xuemei(吴雪梅), NING Zhaoyuan(宁兆元). The Effect of Inductively Coupled Discharge on Capacitively Coupled Nitrogen-Hydrogen Plasma[J]. Plasma Science and Technology, 2014, 16(4): 352-355. DOI: 10.1088/1009-0630/16/4/09
[9]	SHI Xingjian (侍行剑), HU Yemin (胡业民), GAO Zhe (高喆). Optimization of Lower Hybrid Current Drive Efficiency for EAST Plasma with Non-Circular Cross Section and Finite Aspect-Ratio[J]. Plasma Science and Technology, 2012, 14(3): 215-221. DOI: 10.1088/1009-0630/14/3/06
[10]	ZHAO Guoli, XU Yong, SHANG Jianping, LIU Wenyao, ZHU Aimin, WANG Younian. Plasma Uniformity in a Dual Frequency Capacitively Coupled Plasma Reactor Measured by Optical Emission Spectroscopy[J]. Plasma Science and Technology, 2011, 13(1): 61-67.