Citation: | Yuyang LIU, Weiming LI, Yuan YAO, Yao ZHANG, Jiamin ZHANG, Hui LIAN, Bo HONG, Shouxin WANG, Yinxian JIE, Haiqing LIU. First results of CO2 dispersion interferometer on EAST tokamak[J]. Plasma Science and Technology, 2024, 26(3): 034011. DOI: 10.1088/2058-6272/ad0f61 |
A dispersion interferometer (DI) has been installed and operates on the Experimental Advanced Superconducting Tokamak (EAST). This DI system utilizes a continuous-wave 9.3 μm CO2 laser source to measure line-averaged electron densities accurately. In contrast to conventional interferometers, the DI does not require substantial vibration isolations or compensating systems to reduce the impact of vibrations in the optical path. It also employs a ratio of modulation amplitudes, ensuring it remains immune to the variations in detected intensities. Without a variation compensation system, the DI system on EAST reaches a density resolution of less than 1.8 × 10−2π rad and a temporal resolution of 20 μs. The measurements made by the POlarimeter-INTerferometer (POINT) system and the far-infrared hydrogen cyanide (HCN) interferometer are remarkably consistent with the DI’s results. The possibility of fringe jumps and the impact of refraction in high-density discharge can be significantly decreased using a shorter wavelength laser source. A rapid density change of 3 × 1019 m−3 during 0.15 s has been measured accurately in shot No. 114755 of EAST. Additionally, the DI system demonstrates dependability and stability under 305 s long-pulse discharges in shot No. 122054.
We extend our special thanks to Dr. T Akiyama for his invaluable assistance and guidance. This work was supported by the Comprehensive Research Facility for Fusion Technology Program of China (No. 2018-000052-73-01-001228) and the Major Special Science and Technology Project of Anhui Province (No. 912188707023).
[1] |
Veron D Submillimeter interferometry of high-density plasmas In: Button K J Infrared and Millimeter Waves New York: Academic Press 1979
|
[2] |
Van Zeeland M A et al 2023 Fusion Eng. Des. 193 113618 doi: 10.1016/j.fusengdes.2023.113618
|
[3] |
Zheng X W et al 2016 Plasma Phys. Control. Fusion 58 055013 doi: 10.1088/0741-3335/58/5/055013
|
[4] |
Carlstrom T N, Ahlgren D R and Crosbie J 1988 Rev. Sci. Instrum. 59 1063 doi: 10.1063/1.1139726
|
[5] |
Tanaka K et al 2004 Rev. Sci. Instrum. 75 3429 doi: 10.1063/1.1786643
|
[6] |
Kawano Y et al 1996 Rev. Sci. Instrum. 67 1520 doi: 10.1063/1.1146892
|
[7] |
Van Zeeland M A et al 2017 Plasma Phys. Control. Fusion 59 125005 doi: 10.1088/1361-6587/aa8c49
|
[8] |
Drachev V P , Krasnikov Y I and Bagryansky P A 1993 Rev. Sci. Instrum. 64 1010
|
[9] |
Bagryansky P A et al 2006 Rev. Sci. Instrum. 77 053501 doi: 10.1063/1.2202922
|
[10] |
Lizunov A et al 2008 Rev. Sci. Instrum. 79 10E708 doi: 10.1063/1.2969466
|
[11] |
Akiyama T et al 2014 Rev. Sci. Instrum. 85 11D301 doi: 10.1063/1.4886777
|
[12] |
Akiyama T et al 2018 Rev. Sci. Instrum. 89 10B105 doi: 10.1063/1.5037997
|
[13] |
Wang H X et al 2017 Rev. Sci. Instrum. 88 103502 doi: 10.1063/1.4997974
|
[14] |
Lee D G et al 2021 Rev. Sci. Instrum. 92 033536 doi: 10.1063/5.0043629
|
[15] |
Akiyama T et al 2016 Rev. Sci. Instrum. 87 11E133 doi: 10.1063/1.4962050
|
[16] |
Akiyama T et al 2020 J. Instrum. 15 C01004 doi: 10.1088/1748-0221/15/01/C01004
|
[17] |
Xu Q et al 2008 Plasma Sci. Technol. 10 519 doi: 10.1088/1009-0630/10/4/25
|
[18] |
Liu H Q et al 2013 J. Instrum. 8 C11002 doi: 10.1088/1748-0221/8/11/C11002
|
[19] |
Akiyama T et al 2012 J. Instrum. 7 C01055
|
[20] |
Akiyama T et al 2015 J. Instrum. 10 P09022 doi: 10.1088/1748-0221/10/09/P09022
|
[21] |
Li W M et al 2019 Rev. Sci. Instrum. 90 026105 doi: 10.1063/1.5058705
|
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