Effect of coil and chamber structure on plasma radial uniformity in radio frequency inductively coupled plasma

Enhancing plasma uniformity can be achieved by modifying coil and chamber structures in radio frequency inductively coupled plasma (ICP) to meet the demand for large-area and uniformly distributed plasma in industrial manufacturing. This study utilized a two-dimensional self-consistent fluid model to investigate how different coil configurations and chamber aspect ratios affect the radial uniformity of plasma in radio frequency ICP. The findings indicate that optimizing the radial spacing of the coil enhances plasma uniformity but with a reduction in electron density. Furthermore, optimizing the coil within the ICP reactor, using the interior point method in the Interior Point Optimizer significantly enhances plasma uniformity, elevating it from 56% to 96% within the range of the model sizes. Additionally, when the chamber aspect ratio k changes from 2.8 to 4.7, the plasma distribution changes from a center-high to a saddle-shaped distribution. Moreover, the plasma uniformity becomes worse. Finally, adjusting process parameters, such as increasing source power and gas pressure, can enhance plasma uniformity. These findings contribute to optimizing the etching process by improving plasma radial uniformity.