Advanced Search+
Yanyi Wang, Yining Ge, Yong Chen, Li Wang, Xuandong Liu. Investigation of discharge regimes of silicon needle with short air gap[J]. Plasma Science and Technology. DOI: 10.1088/2058-6272/ada344
Citation: Yanyi Wang, Yining Ge, Yong Chen, Li Wang, Xuandong Liu. Investigation of discharge regimes of silicon needle with short air gap[J]. Plasma Science and Technology. DOI: 10.1088/2058-6272/ada344

Investigation of discharge regimes of silicon needle with short air gap

More Information
  • Received Date: September 29, 2024
  • Revised Date: December 22, 2024
  • Accepted Date: December 23, 2024
  • Available Online: December 24, 2024
  • Semiconductor electronic devices are prone to charge accumulation during production and transportation, which usually causes device breakdown. Ionizers are widely used for electrostatic elimination, and utilizing semiconductor silicon for the discharge needle material in ionizers can effectively prevent metal contamination. To investigate the discharge characteristics of silicon needles and their mode modulation mechanism, this study has established an experimental platform for silicon needle-plate discharge under positive polarity voltage. Discharge pulse parameters and optical signals were measured at varying electrode spacings. The experimental results reveal that silicon needle discharge progresses through four regimes: the spontaneous streamer, the periodic streamer, the cluster streamer, and the glow discharge. Among these, the pulse amplitude is most uniform and stable in the periodic streamer regime. In addition, shorter-gap discharge exhibits higher pulse amplitude and repetition frequency but is easier to transition into the filament regime. The formation process of a single pulse is closely related to the field strength in the ionization region near the needle tip. Hence, parameters such as the pulse rising edge time and falling edge time show minimal variation with voltage. The amount of charge generated per unit time is primarily influenced by the repetition frequency. Consequently, the electrostatic ionizer produces the highest, most stable, and most uniform charges if it operates in the periodic streamer regime.
  • Related Articles

    [1]Zhangcan YANG, Junyi FAN. Modeling tungsten response under helium plasma irradiation: a review[J]. Plasma Science and Technology, 2022, 24(12): 124006. DOI: 10.1088/2058-6272/ac9f8f
    [2]WU Ding (吴鼎), LIU Ping (刘平), SUN Liying (孙立影), HAI Ran (海然), DING Hongbin (丁洪斌). Influence of a Static Magnetic Field on Laser Induced Tungsten Plasma in Air[J]. Plasma Science and Technology, 2016, 18(4): 364-369. DOI: 10.1088/1009-0630/18/4/06
    [3]XIE Zhuoming (谢卓明), LIU Rui (刘瑞), FANG Qianfeng (方前锋), ZHANG Tao (张涛), JIANG Yan (蒋燕), WANG Xianping (王先平), LIU Changsong (刘长松). Microstructure and Mechanical Properties of Nano-Size Zirconium Carbide Dispersion Strengthened Tungsten Alloys Fabricated by Spark Plasma Sintering Method[J]. Plasma Science and Technology, 2015, 17(12): 1066-1071. DOI: 10.1088/1009-0630/17/12/15
    [4]LIU Feng (刘凤), XU Yuping (徐玉平), ZHOU Haishan (周海山), et al.. Exposure of Equal-Channel Angular Extruded Tungsten to Deuterium Plasma[J]. Plasma Science and Technology, 2015, 17(7): 595-600. DOI: 10.1088/1009-0630/16/17/7/12
    [5]NIU Guojian(牛国鉴), LI Xiaochun(李小椿), DING Rui(丁锐), XU Qian(徐倩), LUO Guangnan(罗广南). Molecular Dynamics Simulations of Deposition and Damage on Tungsten Plasma-Facing Materials by Tungsten Dust[J]. Plasma Science and Technology, 2014, 16(8): 805-808. DOI: 10.1088/1009-0630/16/8/13
    [6]HU Jing (胡菁), ZHANG Yanwen (张艳文), WANG Xianping (王先平), et al.. Effects of Si 3+ and H + Irradiation on Tungsten Evaluated by Internal Friction Method[J]. Plasma Science and Technology, 2013, 15(10): 1071-1075. DOI: 10.1088/1009-0630/15/10/20
    [7]YU Xingang (余新刚), GOU Fujun (苟富均). Molecular Dynamics Study on the Diffusion Properties of Hydrogen Atoms in Bulk Tungsten[J]. Plasma Science and Technology, 2013, 15(7): 710-715. DOI: 10.1088/1009-0630/15/7/19
    [8]Miyuki YAJIMA, Masato YAMAGIWA, Shin KAJITA, Noriyasu OHNO, Masayuki TOKITANI, Arimichi TAKAYAM, Seiki SAITO, Atsushi M. ITO, Hiroaki NAKAMURA, Naoaki YOSHIDA. Comparison of Damages on Tungsten Surface Exposed to Noble Gas Plasmas[J]. Plasma Science and Technology, 2013, 15(3): 282-286. DOI: 10.1088/1009-0630/15/3/18
    [9]Takanori MIYAMOTO, Shuichi TAKAMURA, Hiroaki KURISHITA. Recovery of Tungsten Surface with Fiber-Form Nanostructure by Plasmas Exposures[J]. Plasma Science and Technology, 2013, 15(2): 161-165. DOI: 10.1088/1009-0630/15/2/17
    [10]ZHU Dahuan(朱大焕), LIU Yang(刘洋), CHEN Junling(陈俊凌), YAN Rong(鄢容). Thermo-Mechanical Calculation of Vacuum Plasma Spraying Tungsten Coating Applied as the Plasma Facing Material for EAST[J]. Plasma Science and Technology, 2012, 14(9): 794-798. DOI: 10.1088/1009-0630/14/9/04

Catalog

    Article views (7) PDF downloads (8) Cited by()

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return