Effects of Electron-Ion Collisions on Stimulated Raman Backward Scattering Under Different Electron Densities

XIANG Jiang; LIU Zhanjun; ZHENG Chunyang

Plasma Science and Technology > 2011 > 13(1): 40-43.

XIANG Jiang, LIU Zhanjun, ZHENG Chunyang. Effects of Electron-Ion Collisions on Stimulated Raman Backward Scattering Under Different Electron Densities[J]. Plasma Science and Technology, 2011, 13(1): 40-43.

Citation:

PDF (303 KB)

Effects of Electron-Ion Collisions on Stimulated Raman Backward Scattering Under Different Electron Densities

1 Institute of Applied Physics and Computational Mathematics, Beijing 100094, China 2 Center for Applied Physics and Technology, State Key Laboratory of Nuclear Physics and Technology, Peking University, Beijing 100871, China

Funds: Supported by the National Natural Science Foundation of China (Nos. 10975023, 10935003), the Sci. & Tech. Funds of CAEP (Grant No. 2010A0102004), and the State Key Development Program for Basic Research Program of China (Grant No. 2007CB814802).

More Information

Graphical Abstract

Abstract

Abstract

Effect of electron-ion collision on stimulated Raman backward scattering (SRBS) spectrum are investigated by numerical simulations. In the given parameters and plasma condition, the growth rates of SRBS are found to strongly depend on the electron density, and the gap in the SRBS spectrum corresponding to the high electron density could be explained by the collisional damping. In the low density region, a much higher Landau damping estimated by the linear theory makes the collisional damping negligible. However, the present results show that, collisions play a even more important role than known in the linear theory.
- Vlasov simulation,
- SRS,
- electron-ion collisions,
- laser plasma.

FullText(HTML)

References (0)

[1]	YANG Lanlan (杨兰兰), TU Yan (屠彦), YU Yongbo (俞永波), HU Dinglan (户玎岚), ZHANG Xiong (张雄). Spatial and Excitation Variations for Different Applied Voltages in an Atmospheric Neon Plasma Jet[J]. Plasma Science and Technology, 2016, 18(9): 912-917. DOI: 10.1088/1009-0630/18/9/07
[2]	DUAN Ping (段萍), LIU Guangrui (刘广睿), BIAN Xingyu (边兴宇), CHEN Long (陈龙), YIN Yan (殷燕), CAO Anning (曹安宁). Effect of the Discharge Voltage on the Performance of the Hall Thruster[J]. Plasma Science and Technology, 2016, 18(4): 382-387. DOI: 10.1088/1009-0630/18/4/09
[3]	WU Yifei (吴益飞), REN Zhigang (任志刚), FENG Ying (冯英), LI Mei (李美), ZHANG Hantian (张含天). Analysis of Fault Arc in High-Speed Switch Applied in Hybrid Circuit Breaker[J]. Plasma Science and Technology, 2016, 18(3): 299-304. DOI: 10.1088/1009-0630/18/3/14
[4]	Hadar MANIS-LEVY, Tsachi LIVNEH, Ido ZUKERMAN, Moshe H. MINTZ, Avi RAVEH. Effect of Radio-Frequency and Low-Frequency Bias Voltage on the Formation of Amorphous Carbon Films Deposited by Plasma Enhanced Chemical Vapor Deposition[J]. Plasma Science and Technology, 2014, 16(10): 954-959. DOI: 10.1088/1009-0630/16/10/09
[5]	YAN Wenyu(燕文宇), ZHANG Qiaogen(张乔根), ZHAO Junping(赵军平), CHEN Gangliang(陈纲亮), LIU Longchen(刘隆晨). Second Discharge Characteristics of Aluminum Wire Electrical Explosion Under Various Argon Pressures[J]. Plasma Science and Technology, 2014, 16(10): 948-953. DOI: 10.1088/1009-0630/16/10/08
[6]	MIAO Chunguang (苗春光), WANG Xiangqin (王相勤). Mass Deposition, Etching and Sputtering Effects of Low-Energy N ⁺ Ion Irradiation on Solid Fly Ash[J]. Plasma Science and Technology, 2013, 15(12): 1232-1236. DOI: 10.1088/1009-0630/15/12/13
[7]	ZHANG Guoping (张国平), WANG Xingquan (王兴权), LV Guohua (吕国华), et al. Deposition of Ti-Al-N Films by Using a Cathodic Vacuum Arc with Pulsed Bias[J]. Plasma Science and Technology, 2013, 15(6): 542-545. DOI: 10.1088/1009-0630/15/6/10
[8]	SONG Yushou(宋玉收), YAN Qiang(颜强), JING Tian(井田), XI Yinyin(席印印), LIU Huilan(刘辉兰). The Distortion of Energy Deposit Distribution of ¹²C Ions in Water[J]. Plasma Science and Technology, 2012, 14(7): 665-669. DOI: 10.1088/1009-0630/14/7/22
[9]	LI Sen, CHEN Qiang, LIU Zhongwei. Restraining Effect of Filaments on Applied Voltage[J]. Plasma Science and Technology, 2012, 14(1): 28-31. DOI: 10.1088/1009-0630/14/1/07
[10]	MU Zongxin (牟宗信), WANG Chun (王春), MU Xiaodong (牟晓东), JIA Li (贾莉), LIU Shengguang (刘升光), DONG Chuang(董闯). Experimental Study of the Effect of Applied Magnetic Field on Plasma Properties of Unbalanced Magnetron Sputtering[J]. Plasma Science and Technology, 2010, 12(5): 571-576.