Plasma Uniformity in a Dual Frequency Capacitively Coupled Plasma Reactor Measured by Optical Emission Spectroscopy

ZHAO Guoli; XU Yong; SHANG Jianping; LIU Wenyao; ZHU Aimin; WANG Younian

Plasma Science and Technology > 2011 > 13(1): 61-67.

ZHAO Guoli, XU Yong, SHANG Jianping, LIU Wenyao, ZHU Aimin, WANG Younian. Plasma Uniformity in a Dual Frequency Capacitively Coupled Plasma Reactor Measured by Optical Emission Spectroscopy[J]. Plasma Science and Technology, 2011, 13(1): 61-67.

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Plasma Uniformity in a Dual Frequency Capacitively Coupled Plasma Reactor Measured by Optical Emission Spectroscopy

1 Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024, China 2 Laboratory of Materials Modification by Beams, Dalian University of Technology, Dalian 116024, China Corresponding Author: yongxu@dlut.edu.cn Tel: 0411-84708548-802 fax: 0411-84708548-808

Funds: supported by National Natural Science Foundation of China (No. 10635010, 10975029) and Beijing Key Laboratory of Printing & Packaging Materials and Technology of Beijing Institute of Graphic Communication (No. 23190110054)

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Abstract

Abstract

Local measurement of plasma radial uniformity was performed in a dual frequency capacitively coupled argon plasma (DF-CCP) reactor using an optical probe. The optical probe collects the light emission from a small separate volume in plasma, thus enabling to diagnose the plasma uniformity for different experimental parameters. Both the gas pressure and the low-frequency (LF) power have apparent effects on the radial uniformity of argon plasma. With the increase in either pressure or LF power, the emission profiles changed from a bell-shaped to a double-peak distribution. The influence of a fused-silica ring around the electrodes on the plasma uniformity was also studied using the optical probe. Possible reasons that result in nonuniform plasmas in our experiments are discussed.
- dual frequency,
- capacitively coupled plasma,
- optical probe,
- plasma uniformity

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