Characterization of Vacuum Ultraviolet (VUV) Radiation for the Development of a Fluorescent Lamp

Hasina KHATUN; A K SHARMA; P K BARHAI

Plasma Science and Technology > 2011 > 13(4): 480-485.

Hasina KHATUN, A K SHARMA, P K BARHAI. Characterization of Vacuum Ultraviolet (VUV) Radiation for the Development of a Fluorescent Lamp[J]. Plasma Science and Technology, 2011, 13(4): 480-485.

Citation:

Hasina KHATUN, A K SHARMA, P K BARHAI. Characterization of Vacuum Ultraviolet (VUV) Radiation for the Development of a Fluorescent Lamp[J]. Plasma Science and Technology, 2011, 13(4): 480-485.

Citation:

Hasina KHATUN, A K SHARMA, P K BARHAI. Characterization of Vacuum Ultraviolet (VUV) Radiation for the Development of a Fluorescent Lamp[J]. Plasma Science and Technology, 2011, 13(4): 480-485.

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Characterization of Vacuum Ultraviolet (VUV) Radiation for the Development of a Fluorescent Lamp

1 Microwave Tubes Area, Central Electronics Engineering Research Institute, Pilani-333031, India 2 Applied Physic Department, Birla Institute of Technology, Ranchi- 835215, India

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Received Date: March 28, 2010

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Abstract

Abstract

A negative unipolar pulsed voltage is applied to study internal electrical parameters of the xenon filled dielectric barrier discharge (DBD) sources. The VUV radiation emitted from these sources is characterized by means of the photoluminescence intensity of the red phosphor pellet. The red phosphor converts the VUV radiation into visible radiation and the emission spectra include a peak at 619.56 nm. The emission characteristics of the red phosphor are analyzed in terms of the pressure-distance (pd), rise time and frequency of the pulsed voltage waveform. The emission intensity measured at different operational conditions confirms that the formation and decay of the xenon excimer, Xe2*, increases with the increase in reduced electric field, E/N. After exceeding certain limits of E/N, the intensity of Xe2* decreases rapidly.
- Dielectric Barrier Discharge,
- vacuum ultraviolet,
- photoluminescence,
- RGB.

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[1]	Pengying JIA, Guoxin HAN, Xiupin DONG, Kaiyue WU, Junxia RAN, Xuexia PANG, Xuexue ZHANG, Jiacun WU, Xuechen LI. Influence of bias voltage and oxygen addition on the discharge aspects of a diffuse argon plume in an atmospheric pressure plasma jet[J]. Plasma Science and Technology, 2024, 26(12): 125402. DOI: 10.1088/2058-6272/ad73ab
[2]	Duc Ba NGUYEN, Quang Hung TRINH, Won Gyu LEE, Young Sun MOK. Analysis of an Ar plasma jet in a dielectric barrier discharge conjugated with a microsecond pulse[J]. Plasma Science and Technology, 2019, 21(9): 95401-095401. DOI: 10.1088/2058-6272/ab1d45
[3]	Hongyue LI (李红月), Xingwei WU (吴兴伟), Cong LI (李聪), Yong WANG (王勇), Ding WU (吴鼎), Jiamin LIU (刘佳敏), Chunlei FENG (冯春雷), Hongbin DING (丁洪斌). Study of spatial and temporal evolution of Ar and F atoms in SF₆/Ar microsecond pulsed discharge by optical emission spectroscopy[J]. Plasma Science and Technology, 2019, 21(7): 74008-074008. DOI: 10.1088/2058-6272/ab0c46
[4]	Yan WANG (王艳), Zhimin LIU (刘智民), Lizhen LIANG (梁立振), Chundong HU (胡纯栋). Preliminary results of optical emission spectroscopy by line ratio method in the RF negative ion source at ASIPP[J]. Plasma Science and Technology, 2019, 21(4): 45601-045601. DOI: 10.1088/2058-6272/aaf592
[5]	Xiang HE (何湘), Chong LIU (刘冲), Yachun ZHANG (张亚春), Jianping CHEN (陈建平), Yudong CHEN (陈玉东), Xiaojun ZENG (曾小军), Bingyan CHEN (陈秉岩), Jiaxin PANG (庞佳鑫), Yibing WANG (王一兵). Diagnostic of capacitively coupled radio frequency plasma from electrical discharge characteristics: comparison with optical emission spectroscopy and fluid model simulation[J]. Plasma Science and Technology, 2018, 20(2): 24005-024005. DOI: 10.1088/2058-6272/aa9a31
[6]	N C ROY, M R TALUKDER, A N CHOWDHURY. OH and O radicals production in atmospheric pressure air/Ar/H₂O gliding arc discharge plasma jet[J]. Plasma Science and Technology, 2017, 19(12): 125402. DOI: 10.1088/2058-6272/aa86a7
[7]	LAN Hui (兰慧), WANG Xinbing (王新兵), ZUO Duluo (左都罗). Time-Resolved Optical Emission Spectroscopy Diagnosis of CO₂ Laser-Produced SnO₂ Plasma[J]. Plasma Science and Technology, 2016, 18(9): 902-906. DOI: 10.1088/1009-0630/18/9/05
[8]	Panagiotis SVARNAS. Vibrational Temperature of Excited Nitrogen Molecules Detected in a 13.56 MHz Electrical Discharge by Sheath-Side Optical Emission Spectroscopy[J]. Plasma Science and Technology, 2013, 15(9): 891-895. DOI: 10.1088/1009-0630/15/9/11
[9]	WU Jing (吴静), ZHANG Pengyun (张鹏云), SUN Jizhong (孙继忠), YAO Lieming (姚列明), DUAN Xuru(段旭如). Diagnostics of Parameters by Optical Emission Spectroscopy and Langmuir Probe in Mixtures (SiH4/C2H4/Ar) Ratio-Frequency Discharge[J]. Plasma Science and Technology, 2011, 13(5): 561-566.
[10]	N. U. REHMAN, F. U. KHAN, S. NASEER, G. MURTAZA, S. S. HUSSAIN, I. AHMAD, M. ZAKAULLAH. Trace-Rare-Gas Optical Emission Spectroscopy of Nitrogen Plasma Generated at a Frequency of 13.56 MHz[J]. Plasma Science and Technology, 2011, 13(2): 208-212.