Discharge Properties of High-Power Pulsed Unbalanced Magnetron Sputtering

MU Zongxin; LIU Shengguang; ZANG Hairong; WANG Chun; MU Xiaodong

Plasma Science and Technology > 2011 > 13(6): 667-671.

MU Zongxin, LIU Shengguang, ZANG Hairong, WANG Chun, MU Xiaodong. Discharge Properties of High-Power Pulsed Unbalanced Magnetron Sputtering[J]. Plasma Science and Technology, 2011, 13(6): 667-671.

Citation:

MU Zongxin, LIU Shengguang, ZANG Hairong, WANG Chun, MU Xiaodong. Discharge Properties of High-Power Pulsed Unbalanced Magnetron Sputtering[J]. Plasma Science and Technology, 2011, 13(6): 667-671.

Citation:

MU Zongxin, LIU Shengguang, ZANG Hairong, WANG Chun, MU Xiaodong. Discharge Properties of High-Power Pulsed Unbalanced Magnetron Sputtering[J]. Plasma Science and Technology, 2011, 13(6): 667-671.

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Discharge Properties of High-Power Pulsed Unbalanced Magnetron Sputtering

Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams, Ministry of Education, School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian, China 116024

Funds: supported by the National Natural Science Foundation of China (No. 50407015) and the Scientific Research Fund of the Liaoning Provincial Education Department.

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Received Date: July 28, 2011

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Abstract

Abstract

High-power pulsed magnetron sputtering (HPPMS or HiPIMS) is an emerging coating technology that produces very dense plasmas and highly ionized sputtering atoms. This paper is focused on discharge properties, unbalanced features and temporal evolution of pulse current of the HPPMS discharge. A hollow cathode was used to suppress the scattering of charges. A coaxial coil surrounding the target was used to control the breakdown voltage and pulse repetition frequency by varying the coil current. A Langmuir probe and an oscilloscope were used to simultaneously measure the floating potential, pulse voltage and pulse current signals. The pulse power density in the discharge reached 10 kW/cm2 with frequencies as high as ~40 Hz and a pulse width of ~1–5 ms. The characteristics of the discharge evolution were analyzed using magnetron discharge dynamics.
- Plasma sources,
- Electric discharges,
- Deposition by sputtering

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