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脉冲和射频源联合驱动的CCP碰撞鞘层物理特性

Characteristics of a Collisional Sheath Biased by a Dual Frequency Source

  • 摘要: 本文采用混杂模拟研究了双频碰撞CCP鞘层物理特性。双频源采用的是脉冲和射频源联合的电流驱动方式, 双频源加于同一极板。混杂模拟即采用流体模型模拟碰撞鞘层物理特性, 利用所得到的电场, 进一步使用MC方法得到到达极板的IED和IAD。本文研究了频率比和气压对鞘层各参数及IED、IAD的影响规律。结果表明, 外加驱动的频率比和气压对鞘层特性和IED影响都很大。而IAD则明显对气压的改变更为敏感。

     

    Abstract: A hybrid model is used to simulate the characteristics of a collisional sheath in a capacitively coupled plasma (CCP) driven by a dual frequency source including a RF and a pulsed current source applied to the same electrode. The hybrid model includes a fluid model used to simulate the characteristics of the collisional sheath, and a Monte-Carlo (MC) method to obtain both ion energy and ion angular distributions (IEDs and IADs) impinging on the substrate. The effect of the low frequency of the pulsed source and the gas pressure on the characteristics of the sheath, as well as the IEDs and IADs, were studied. The results show that the ratio of pulse/RF frequency and the gas pressure are crucial for the characteristics of the sheath and the IEDs. The IADs are significantly more sensitive to the gas pressure.

     

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