Advanced Search+
SUN Weizhong (孙伟中), ZHAO Chengli (赵成利), ZHANG Junyuan (张俊源), CHEN Feng (陈峰), GOU Fujun (苟富均). An MD Study of the Temperature E®ect on H Interacting with SiC (100)[J]. Plasma Science and Technology, 2012, 14(12): 1121-1124. DOI: 10.1088/1009-0630/14/12/16
Citation: SUN Weizhong (孙伟中), ZHAO Chengli (赵成利), ZHANG Junyuan (张俊源), CHEN Feng (陈峰), GOU Fujun (苟富均). An MD Study of the Temperature E®ect on H Interacting with SiC (100)[J]. Plasma Science and Technology, 2012, 14(12): 1121-1124. DOI: 10.1088/1009-0630/14/12/16

An MD Study of the Temperature E®ect on H Interacting with SiC (100)

  • Molecular dynamics simulations were performed to study the interaction between atomic hydrogen and silicon carbide. In the present study, we focus on the effect of the surface temperature on H interacting with silicon carbide. The simulation results show that the retention of H atoms in the sample decreases linearly with increasing surface temperature. The depth profile analysis shows that the sample is modified by H bombardment, and the density of H atoms is greater than those of Si and C atoms near the interface region between the H-containing region and the bulk. However, near the surface region the densities of H, Si and C atoms are almost equivalent. In the modi¯ed layer, the bonds consist of Si-C and Si-H and C-H. The fraction of Si-C bonds is the greatest. Only a few C-H bonds are present.
  • loading

Catalog

    Turn off MathJax
    Article Contents

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return