Experimental Characterization of Dual-Frequency Capacitively Coupled Plasma with Inductive Enhancement in Argon

BAI Yang (柏洋); JIN Chenggang (金成刚); YU Tao (余涛); WU Xuemei (吴雪梅); et al.

doi:10.1088/1009-0630/15/10/08

Plasma Science and Technology > 2013 > 15(10): 1002-1005. > DOI: 10.1088/1009-0630/15/10/08

BAI Yang (柏洋), JIN Chenggang (金成刚), YU Tao (余涛), WU Xuemei (吴雪梅), et al.. Experimental Characterization of Dual-Frequency Capacitively Coupled Plasma with Inductive Enhancement in Argon[J]. Plasma Science and Technology, 2013, 15(10): 1002-1005. DOI: 10.1088/1009-0630/15/10/08

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Experimental Characterization of Dual-Frequency Capacitively Coupled Plasma with Inductive Enhancement in Argon

1 School of Physics Science and Technology, Soochow University, Suzhou 215006, China 2 Analysis and Testing Center, Soochow University, Suzhou 215123, China

Funds: supported by ITER Project (Nos.2010GB106000,2010GB106009); National Natural Science Foundation of China (Nos.10975106, 11175126, 11075114, 11204266); Qing Lan Project, the Project Funded by the Priority Academic Program Development of Jiangsu Higher Education Institutions; The Program for Graduates Research & Innovation in University of Jiangsu Province, China (No.CXZZ11-0085)

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Received Date: July 21, 2012

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Abstract

Abstract

The dual-frequency capacitively coupled plasma (DF-CCP) with inductive enhance- ment system is a newly designed plasma reactor. Different from the conventional inductively cou- pled plasma (ICP) reactors, now a radio frequency (rf) power is connected to an antenna placed outside the chamber with a one-turn bare coil placed between two electrodes in DF-CCP. This paper gives a detailed description of its structure. Moreover, investigations on some characteristics of discharges in this apparatus were made via a Langmuir probe.

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