Citation: | LU Wenqi (陆文琪), JIANG Xiangzhan (蒋相站), LIU Yongxin (刘永新), YANG Shuo (杨烁), et al. Improved Double-Probe Technique for Spatially Resolved Diagnosis of Dual-Frequency Capacitive Plasmas[J]. Plasma Science and Technology, 2013, 15(6): 511-515. DOI: 10.1088/1009-0630/15/6/05 |
[1] | Gao ZHAO (赵高), Wanying ZHU (朱婉莹), Huihui WANG (王慧慧), Qiang CHEN (陈强), Chang TAN (谭畅), Jiting OUYANG (欧阳吉庭). Study of axial double layer in helicon plasma by optical emission spectroscopy and simple probe[J]. Plasma Science and Technology, 2018, 20(7): 75402-075402. DOI: 10.1088/2058-6272/aab4f1 |
[2] | WANG Hongyu (王虹宇), JIANG Wei (姜巍), SUN Peng (孙鹏), ZHAO Shuangyun (赵双云), LI Yang (李阳). Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma[J]. Plasma Science and Technology, 2016, 18(2): 143-146. DOI: 10.1088/1009-0630/18/2/08 |
[3] | BAI Yujing (白玉静), LI Jianquan (李建泉), XU Jun (徐军), LU Wenqi (陆文琪), WANG Younian (王友年), DING Wanyu (丁万昱 ). Improvement of the Harmonic Technique of Probe for Measurements of Electron Temperature and Ion Density[J]. Plasma Science and Technology, 2016, 18(1): 58-61. DOI: 10.1088/1009-0630/18/1/10 |
[4] | XU Yijun (徐轶君), WU Xuemei (吴雪梅), YE Chao (叶超). Effect of Low-Frequency Power on Etching Characteristics of 6H-SiC in C 4 F 8 /Ar Dual-Frequency Capacitively Coupled Plasma[J]. Plasma Science and Technology, 2013, 15(10): 1066-1070. DOI: 10.1088/1009-0630/15/10/19 |
[5] | BAI Yang (柏洋), JIN Chenggang (金成刚), YU Tao (余涛), WU Xuemei (吴雪梅), et al.. Experimental Characterization of Dual-Frequency Capacitively Coupled Plasma with Inductive Enhancement in Argon[J]. Plasma Science and Technology, 2013, 15(10): 1002-1005. DOI: 10.1088/1009-0630/15/10/08 |
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