Advanced Search+
LU Wenqi (陆文琪), JIANG Xiangzhan (蒋相站), LIU Yongxin (刘永新), YANG Shuo (杨烁), et al. Improved Double-Probe Technique for Spatially Resolved Diagnosis of Dual-Frequency Capacitive Plasmas[J]. Plasma Science and Technology, 2013, 15(6): 511-515. DOI: 10.1088/1009-0630/15/6/05
Citation: LU Wenqi (陆文琪), JIANG Xiangzhan (蒋相站), LIU Yongxin (刘永新), YANG Shuo (杨烁), et al. Improved Double-Probe Technique for Spatially Resolved Diagnosis of Dual-Frequency Capacitive Plasmas[J]. Plasma Science and Technology, 2013, 15(6): 511-515. DOI: 10.1088/1009-0630/15/6/05

Improved Double-Probe Technique for Spatially Resolved Diagnosis of Dual-Frequency Capacitive Plasmas

Funds: supported by National Natural Science Foundation of China (No. 10635010) and the Specialized Research Fund for the Doctoral Program of Higher Education of China (No. 20090041110026)
More Information
  • Received Date: August 14, 2011
  • The conventional double-probe technique was improved with a combination of self- powering and radio-frequency (RF) choking. RF perturbations in dual-frequency capacitively coupled discharge were effectively eliminated, as judged by the disappearance of self-bias on the probes. The improved technique was tested by spatially resolved measurements of the electron temperature and ion density in both the axial and radial directions of a dual-frequency capacitive plasma. The measured data in the axial direction were compared with simulation results, and they were excellently consistent with each other. The measured radial distributions of the ion density and electron temperature were in°uenced significantly by the lower frequency (LF) power. It was shown that superposition of the lower frequency to the higher frequency (HF) power shifted the maximum ion density from the radial center to the edge region, while the trend for the electron temperature profile was the opposite. The changing feature of the ion density distribution is qualitatively consistent with that of the optical emission intensity reported.
  • Related Articles

    [1]Gao ZHAO (赵高), Wanying ZHU (朱婉莹), Huihui WANG (王慧慧), Qiang CHEN (陈强), Chang TAN (谭畅), Jiting OUYANG (欧阳吉庭). Study of axial double layer in helicon plasma by optical emission spectroscopy and simple probe[J]. Plasma Science and Technology, 2018, 20(7): 75402-075402. DOI: 10.1088/2058-6272/aab4f1
    [2]WANG Hongyu (王虹宇), JIANG Wei (姜巍), SUN Peng (孙鹏), ZHAO Shuangyun (赵双云), LI Yang (李阳). Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma[J]. Plasma Science and Technology, 2016, 18(2): 143-146. DOI: 10.1088/1009-0630/18/2/08
    [3]BAI Yujing (白玉静), LI Jianquan (李建泉), XU Jun (徐军), LU Wenqi (陆文琪), WANG Younian (王友年), DING Wanyu (丁万昱 ). Improvement of the Harmonic Technique of Probe for Measurements of Electron Temperature and Ion Density[J]. Plasma Science and Technology, 2016, 18(1): 58-61. DOI: 10.1088/1009-0630/18/1/10
    [4]XU Yijun (徐轶君), WU Xuemei (吴雪梅), YE Chao (叶超). Effect of Low-Frequency Power on Etching Characteristics of 6H-SiC in C 4 F 8 /Ar Dual-Frequency Capacitively Coupled Plasma[J]. Plasma Science and Technology, 2013, 15(10): 1066-1070. DOI: 10.1088/1009-0630/15/10/19
    [5]BAI Yang (柏洋), JIN Chenggang (金成刚), YU Tao (余涛), WU Xuemei (吴雪梅), et al.. Experimental Characterization of Dual-Frequency Capacitively Coupled Plasma with Inductive Enhancement in Argon[J]. Plasma Science and Technology, 2013, 15(10): 1002-1005. DOI: 10.1088/1009-0630/15/10/08
    [6]LIU Wenyao (刘文耀), ZHU Aimin (朱爱民), Li Xiaosong (李小松), ZHAO Guoli (赵国利), et al.. Determination of Plasma Parameters in a Dual-Frequency Capacitively Coupled CF 4 Plasma Using Optical Emission Spectroscopy[J]. Plasma Science and Technology, 2013, 15(9): 885-890. DOI: 10.1088/1009-0630/15/9/10
    [7]YU Yiqing(虞一青), XIN Yu(辛煜), LU Wenqi(陆文琪), NING Zhaoyuan(宁兆元). Abnormal Enhancement of N2+ Emission Induced by Lower Frequencies in N2 Dual-Frequency Capacitively Coupled Plasmas[J]. Plasma Science and Technology, 2012, 14(3): 222-226. DOI: 10.1088/1009-0630/14/3/07
    [8]CHENG Li (程立), SHI Jia-ming(时家明), XU Bo (许波). Analytical Expressions of Dual-Frequency Plasma Diagnostic Theory[J]. Plasma Science and Technology, 2012, 14(1): 37-39. DOI: 10.1088/1009-0630/14/1/09
    [9]YU Yiqing(虞一青), XIN Yu(辛煜), LU Wenqi(陆文琪), NING Zhaoyuan(宁兆元). Investigation of Capacitively Coupled Argon Plasma Driven by Dual-Frequency with Different Frequency Configurations[J]. Plasma Science and Technology, 2011, 13(5): 571-574.
    [10]ZHAO Guoli, XU Yong, SHANG Jianping, LIU Wenyao, ZHU Aimin, WANG Younian. Plasma Uniformity in a Dual Frequency Capacitively Coupled Plasma Reactor Measured by Optical Emission Spectroscopy[J]. Plasma Science and Technology, 2011, 13(1): 61-67.

Catalog

    Article views (280) PDF downloads (1129) Cited by()

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return