Determination of Plasma Parameters in a Dual-Frequency Capacitively Coupled CF<sub> 4</sub> Plasma Using Optical Emission Spectroscopy

LIU Wenyao (刘文耀); ZHU Aimin (朱爱民); Li Xiaosong (李小松); ZHAO Guoli (赵国利); et al.

doi:10.1088/1009-0630/15/9/10

Plasma Science and Technology > 2013 > 15(9): 885-890. > DOI: 10.1088/1009-0630/15/9/10

LIU Wenyao (刘文耀), ZHU Aimin (朱爱民), Li Xiaosong (李小松), ZHAO Guoli (赵国利), et al.. Determination of Plasma Parameters in a Dual-Frequency Capacitively Coupled CF₄ Plasma Using Optical Emission Spectroscopy[J]. Plasma Science and Technology, 2013, 15(9): 885-890. DOI: 10.1088/1009-0630/15/9/10

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Determination of Plasma Parameters in a Dual-Frequency Capacitively Coupled CF₄ Plasma Using Optical Emission Spectroscopy

1 Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024, China 2 School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China

Funds: supported by National Natural Science Foundation of China (No.10975029), and the Important National Science and Technology Specific Project of China (No.2011ZX02403-001)

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Received Date: March 19, 2012

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Abstract

Abstract

Optical emission spectroscopy measurements of dual-frequency capacitively coupled CF 4 plasmas were carried out. The gas temperature (T _g ) was acquired by fitting the optical emission spectra of a CF B−X system in 201∼206 nm. The atomic fluorine concentration and the electron temperature (T_e ) were obtained by trace rare gas optical emission spectroscopy and a modified Boltzmann plot technique, respectively. It was found that the gas temperature was about 620±30 K at 50 mTorr and the atomic fluorine concentration increased while the electron temperature decreased with increasing gas pressure and power of high frequency (60 MHz). With increasing low frequency (2 MHz) power, the electron temperature also increased, but the atomic fluorine concentration was insensitive to this change. The generation and disappearance mecha- nisms of F atoms are discussed.

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