Deposition of Diamond-Like Carbon on Inner Surface by Hollow Cathode Discharge

LI Shichao(李世超); HE Feng(何锋); GUO Qi(郭琦); OUYANG Jiting(欧阳吉庭)

doi:10.1088/1009-0630/16/1/14

Plasma Science and Technology > 2014 > 16(1): 63-67. > DOI: 10.1088/1009-0630/16/1/14

LI Shichao(李世超), HE Feng(何锋), GUO Qi(郭琦), OUYANG Jiting(欧阳吉庭). Deposition of Diamond-Like Carbon on Inner Surface by Hollow Cathode Discharge[J]. Plasma Science and Technology, 2014, 16(1): 63-67. DOI: 10.1088/1009-0630/16/1/14

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Deposition of Diamond-Like Carbon on Inner Surface by Hollow Cathode Discharge

School of Physics, Beijing Institute of Technology, Beijing 100081, China

Funds: supported by National Natural Science Foundation of China (No.11005009)

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Received Date: September 08, 2013

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Abstract

Abstract

A cylindrical hollow cathode discharge (HCD) in CH ₄ /Ar gas mixture at pressure of 20-30 Pa was used to deposit diamond-like carbon (DLC) films on the inner surface of a stainless steel tube. The characteristics of the HCD including the voltage-current curves, the plasma im- ages and the optical emission spectrum (OES) were measured in Ar and CH ₄ /Ar mixtures. The properties of DLC films prepared under different conditions were analyzed by means of Raman spectroscopy and scanning electron microscopy (SEM). The results show that the electron exci- tation temperature of HCD plasma is about 2400 K. DLC films can be deposited on the inner surface of tubes. The ratio of sp ³ /sp ² bonds decreases with the applied voltage and the deposition time. The optimizing CH 4 content was found to be around CH ₄ /Ar =1/5 for good quality of DLC films in the present system.
- diamond-like carbon,
- hollow cathode discharge,
- film deposition,
- inner surface

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