Parameter Optimization for Enhancement of Ethanol Yield by Atmospheric Pressure DBD-Treated <i>Saccharomyces cerevisiae</i>

DONG Xiaoyu(董晓宇); YUAN Yulian(袁玉莲); TANG Qian(唐乾); DOU Shaohua(窦少华); DI Lanbo(底兰波); ZHANG Xiuling(张秀玲)

doi:10.1088/1009-0630/16/1/16

Plasma Science and Technology > 2014 > 16(1): 73-78. > DOI: 10.1088/1009-0630/16/1/16

DONG Xiaoyu(董晓宇), YUAN Yulian(袁玉莲), TANG Qian(唐乾), DOU Shaohua(窦少华), DI Lanbo(底兰波), ZHANG Xiuling(张秀玲). Parameter Optimization for Enhancement of Ethanol Yield by Atmospheric Pressure DBD-Treated Saccharomyces cerevisiae[J]. Plasma Science and Technology, 2014, 16(1): 73-78. DOI: 10.1088/1009-0630/16/1/16

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Parameter Optimization for Enhancement of Ethanol Yield by Atmospheric Pressure DBD-Treated Saccharomyces cerevisiae

1 School of Life Science and Biotechnology, Dalian University, Dalian 116622, China 2 School of Physical Science and Technology, Dalian University, Dalian 116622, China

Funds: supported by National Natural Science Foundation of China (Nos.21246012, 21306015), Liaoning Provincial Public Welfare Research Foundation for Science Career of China (No.2011005001), Liaoning Provincial Natural Science Foundation of China (No.201205531) and Scientific Research Fund of Liaoning Provincial Education Department (No.L2011220)

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Abstract

Abstract

In this study, Saccharomyces cerevisiae (S. cerevisiae) was exposed to dielectric barrier discharge plasma (DBD) to improve its ethanol production capacity during fermenta- tion. Response surface methodology (RSM) was used to optimize the discharge-associated pa- rameters of DBD for the purpose of maximizing the ethanol yield achieved by DBD-treated S. cerevisiae. According to single factor experiments, a mathematical model was established using Box-Behnken central composite experiment design, with plasma exposure time, power supply volt- age, and exposed-sample volume as impact factors and ethanol yield as the response. This was followed by response surface analysis. Optimal experimental parameters for plasma discharge- induced enhancement in ethanol yield were plasma exposure time of 1 min, power voltage of 26 V, and an exposed sample volume of 9 mL. Under these conditions, the resulting yield of ethanol was 0.48 g/g, representing an increase of 33% over control.

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